Helium ion lithography principles and performance

Nanofabrication: Techniques and Principles

Volumn 9783709104248, Issue , 2012, Pages 93-116

  Van Der Drift, Emile ^a   Maas, Diederik J ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b TNO   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

HELIUM; ION BEAM LITHOGRAPHY;

ALUMINUM OXIDES; CRITICAL CONDITION; FABRICATION TECHNIQUE; ORDERS OF MAGNITUDE; PATTERN DEFINITION; PATTERN TRANSFERS; SHOT NOISE EFFECTS; STATE-OF-THE-ART PERFORMANCE;

IONS;

EID: 84930913210     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1007/978-3-7091-0424-8_4     Document Type: Chapter

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