Comparative study of sputtered and spin-coatable aluminum oxide electron beam resists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 2737-2744

  Saifullah, M S M ^a   Kurihara, K ^b   Humphreys, C J ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ETCHING; NANOTECHNOLOGY; SEMICONDUCTING SILICON; SPUTTERING; SUBSTRATES;

ELECTRON BEAM RESISTS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034317394     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1323970     Document Type: Article

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