Gas-phase deposition of ultrathin aluminium oxide films on nanoparticles at ambient conditions

Materials

Volumn 8, Issue 3, 2015, Pages 1249-1263

  Valdesueiro, David ^a   Meesters, Gabrie M H ^a   Kreutzer, Michiel T ^a   van Ommen, J Ruud ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Aluminium oxide; Ambient conditions; Atmospheric pressure; Atomic layer deposition (ALD); Coating; Fluidized bed reactor; Nanoparticles; Room temperature; Thin films

Indexed keywords

ALUMINA; ALUMINUM; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATMOSPHERIC TEMPERATURE; ATOMIC LAYER DEPOSITION; ATOMS; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COATINGS; DEPOSITION; DIAMOND FILMS; FLUID CATALYTIC CRACKING; FLUIDIZATION; FLUIDIZED BED FURNACES; FLUIDIZED BEDS; GRAVIMETRIC ANALYSIS; MOLECULES; NANOPARTICLES; OXIDES; SUPERSATURATION; THERMOGRAVIMETRIC ANALYSIS; THIN FILMS; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS;

ALUMINIUM OXIDE; AMBIENT CONDITIONS; CHEMICAL VAPOUR DEPOSITION; FLUIDIZED BED REACTORS; ROOM TEMPERATURE; THERMAL GRAVIMETRIC ANALYSES (TGA); TITANIUM OXIDE NANO-PARTICLES; ULTRA-THIN ALUMINIUM OXIDE;

OXIDE FILMS;

EID: 84930216325     PISSN: None     EISSN: 19961944     Source Type: Journal    
DOI: 10.3390/ma8031249     Document Type: Article

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