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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 1, 2012, Pages

Room temperature atomic layer deposition of Al 2O 3 and replication of butterfly wings for photovoltaic application

(11) Tang, X a Francis, L A a Simonis, P b Haslinger, M a Delamare, R a Deschaume, O a Flandre, D a Defrance, P a Jonas, A M a Vigneron, J P b Raskin, J P a

a UNIVERSITÉ CATHOLIQUE DE LOUVAIN (Belgium)

b UNIVERSITY OF NAMUR (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION STRUCTURES; BIO-INSPIRED; BUTTERFLY WINGS; CAPACITANCE VOLTAGE MEASUREMENTS; KEY PROCESS; MEASUREMENT RESULTS; NANO-IMPRINT; NEGATIVE CHARGE; P-TYPE SI; PASSIVATION LAYER; PHOTOVOLTAIC APPLICATIONS; POTENTIAL APPLICATIONS; QUASI-STEADY-STATE PHOTOCONDUCTANCE; REAR SIDE; ROOM TEMPERATURE; SI WAFER; ULTRA-THIN;

ALUMINUM; ATOMIC LAYER DEPOSITION; MONOCRYSTALLINE SILICON; PASSIVATION; SEMICONDUCTING SILICON COMPOUNDS; SILICON OXIDES; SOLAR ENERGY;

SILICON WAFERS;

EID: 84855588204 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3669521 Document Type: Article

Times cited : (19)

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