Calculation of growth per cycle (GPC) of atomic layer deposited aluminium oxide nanolayers and dependence of GPC on surface OH concentration

Pramana - Journal of Physics

Volumn 82, Issue 3, 2014, Pages 563-569

  Philip, Anu ^a   Thomas, Subin ^a   Kumar, K Rajeev ^a  

^a Department of Physics   (India)

Author keywords

Aluminium oxide; Atomic layer deposition; High A

Indexed keywords

ATOMIC LAYER DEPOSITION; DEPOSITION; MONOLAYERS; OXIDES;

ALUMINIUM OXIDE; ATOMIC LAYER DEPOSITED; EXPERIMENTAL VALUES; HIGH-A; MONOLAYER THICKNESS; NUMBER OF CYCLES; SUBSTRATE SURFACE; THEORETICAL CALCULATIONS;

FILM GROWTH;

EID: 84896380394     PISSN: 03044289     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12043-014-0715-8     Document Type: Article

References (22)

1. R L Puurunen, J. Appl. Phys. 97(12), 121301 (2005)
2. G D Wilk, R M Wallace and J M Anthony, J. Appl. Phys. 89, 5243 (2001)
3. A C Jones, H C Aspinall, P R Chalker, R J Potter, K Kukli, A Rahtu, M Ritala and M Leskelo, J. Mater. Chem. 14, 3101 (2004)
4. M D Halls and K Raghavachari, J. Chem. Phys. 118, 1022 (2003)
5. S M George, Chem. Rev. 110, 111 (2010)
6. S Duenas, H Castán, H García, A de Castro, L Bailón, K Kukli, A Aidla, J Aarik, H Mondar, T Uustare, J Lu and V Hårsta, J. Appl. Phys. 99, 054902 (2006)
7. L Ninitso, J Pivassari, J Ninitso, M Putkonen and M Nieminen, Phys. Stat. Sol. (a) 201(7), 1443 (2004)
8. R L David, Hand book of chemistry and physics, 88th edn (CRC Press, Boca Raton, FL, 2007)
9. Anu Philip and K Rajeev Kumar, Bull. Mater. Sci. 33(2), 97 (2010)
10. J D Ferguson, A W Weimer and S M George, Thin Solid Films 371, 95 (2000)
11. J D Ferguson, A W Weimer and S M George, Chem. Mater. 16, 5602 (2004)
12. A W Ott, J W Klaus, J M Johnson and S M George, Thin Solid Films 292, 135 (1997)
13. J A McCormick, B L Cloutier and A W Weimer, J. Vac. Sci. Technol. A 25(1), 67 (2007)
14. W Jeffrey, S M George and A W Weimer, Powder Technol. 142, 59 (2004)
15. G Elisa, P Claudio, G Enos, F Cesare, V Lia and A Sevd, Jpn J. Appl. Phys. 47(10), 8174 (2008)
16. X Liang, G D Zhan, D M King, J A McCormick, J Zhang, S M George and A Weimer, Diam. Relat. Mater. 17, 185 (2008)
17. R L Puurunen, Chem. Vap. Deposition 9(5), 249 (2003)
18. S Haukka and A Root, J. Phys. Chem. 98(6), 1695 (1994)
19. D R Biswas, C Ghosh and R L Layman, J. Electrochem. Soc. 130, 234 (1983)
20. R L Puurunen, Chem. Vap. Deposition 9(6), 327 (2003)
21. M D Groner, F H Fabreguette, J W Elam and S M George, Chem. Mater. 16, 639 (2004)
22. J A McCormick, K P Rice, D F Paul, A W Weimer and S M George, Chem. Vap. Deposition 13, 491 (2007)