Thermal stability of lanthanum oxide/Si(100) interfacial transition layer

ECS Transactions

Volumn 1, Issue 1, 2006, Pages 87-95

  Nohira, H ^a   Yoshida, T ^a   Okamoto, H ^a   Sakai, W ^b   Nakajima, K ^b   Suzuki, M ^b   Kimura, K ^b   Aun, Ng Jin ^c   Kobayashi, Y ^c   Ohmi, S ^c   Iwai, H ^c   Ikenaga, E ^d   Kobayashi, K ^d   Takata, Y ^e   Hattori, T ^a  

^a TOKYO CITY UNIVERSITY   (Japan)

^b KYOTO UNIVERSITY   (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^d JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^e RIKEN/SPring 8 ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATMOSPHERIC PRESSURE; ENTROPY; NITROGEN; PHOTOELECTRON SPECTROSCOPY; STRUCTURE (COMPOSITION); TEMPERATURE MEASUREMENT; THERMODYNAMIC STABILITY;

INTERFACIAL TRANSITION LAYER; LANTHANUM OXIDE; LANTHANUM SILICATE; NITROGEN GAS;

LANTHANUM COMPOUNDS;

EID: 32844459019     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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