High- and low-energy x-ray photoelectron techniques for compositional depth profiles: Destructive versus non-destructive methods

Journal of Physics D: Applied Physics

Volumn 46, Issue 6, 2013, Pages

  Benito, Noelia ^a   Galindo, Ramón Escobar ^b   Rubio Zuazo, Juan ^b,c   Castro, Germán R ^b,c   Palacio, Carlos ^a  

^a UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

^b INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^c EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE-RESOLVED X-RAY PHOTOELECTRON SPECTROSCOPY; ATOMIC MIXING; BURIED INTERFACE; CHEMICAL INFORMATION; COMPARATIVE STUDIES; COMPOSITIONAL DEPTH PROFILE; CONCENTRATION-DEPTH PROFILE; DESTRUCTIVE TECHNIQUES; EMISSION ANGLE; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; ION-MATTER INTERACTION; KEY PARAMETERS; LOW-ENERGY X-RAYS; MIXED OXIDE; NON-DESTRUCTIVE TECHNIQUE; NONDESTRUCTIVE METHODS; PHOTON ENERGY RANGE; THIN FILM OXIDES;

CHEMICAL ANALYSIS; MIXING; NONDESTRUCTIVE EXAMINATION; PHOTOELECTRONS; SILICON; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHROMIUM;

EID: 84873846450     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/46/6/065310     Document Type: Article

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