Evaluation of niobium dimethylamino-ethoxide for chemical vapour deposition of niobium oxide thin films

Thin Solid Films

Volumn 571, Issue P1, 2014, Pages 94-101

  Dabirian, Ali ^a   Kuzminykh, Yury ^a,b   Wagner, Estelle ^c,d   Benvenuti, Giacomo ^c,d   Rushworth, Simon ^e   Hoffmann, Patrik ^a,b  

^a EPFL   (Switzerland)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^c 3D Oxides Sas   (France)

^d ABCD Technology Sarl   (Switzerland)

^e UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

Chemical vapour deposition; Combinatorial film deposition; Metal organic precursors; Niobium alkoxide; Niobium oxide

Indexed keywords

ASPECT RATIO; ATOMIC LAYER DEPOSITION; CARBON FILMS; FILM GROWTH; MOLECULAR BEAMS; NIOBIUM OXIDE; OPTICAL PROPERTIES; ORGANOMETALLICS; OXIDE FILMS; REACTION RATES; SUBSTRATES; ULTRATHIN FILMS; VAPOR PRESSURE;

ALKOXIDES; CHEMICAL COMPOSITIONS; CHEMICAL VAPOUR DEPOSITION; COMPLEX OXIDE FILMS; DEPOSITION TEMPERATURES; FILM DEPOSITION; METAL ORGANIC PRECURSORS; PHOTOELECTROCHEMICAL WATER SPLITTING;

CHEMICAL VAPOR DEPOSITION;

EID: 84919685035     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2014.09.073     Document Type: Article

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