Study on the degradation mechanism of the ferroelectric properties of thin Hf0.5Zr0.5O2 films on TiN and Ir electrodes

Applied Physics Letters

Volumn 105, Issue 7, 2014, Pages

  Park, Min Hyuk ^a   Kim, Han Joon ^a   Kim, Yu Jin ^a   Lee, Woongkyu ^a   Moon, Taehwan ^a   Kim, Keum Do ^a   Hwang, Cheol Seong ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DEGRADATION; ELECTRODES; FERROELECTRIC FILMS; FERROELECTRICITY; OXYGEN SUPPLY; TITANIUM NITRIDE; ZIRCONIUM COMPOUNDS;

CRITICAL THICKNESS; DEGRADATION MECHANISM; FERROELECTRIC PROPERTY; IR ELECTRODE; MONOCLINIC PHASE; TIN ELECTRODES;

HAFNIUM COMPOUNDS;

EID: 84910613112     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4893376     Document Type: Article

References (25)

1. C. S. Hwang, Atomic Layer Deposition for Semiconductors (Springer US, New York, 2014).
2. G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. 89, 5243 (2001). 10.1063/1.1361065
3. S. Mueller, J. Mueller, A. Singh, S. Riedel, J. Sundqvist, U. Schroeder, and T. Mikolajick, Adv. Funct. Mater. 22, 2412 (2012). 10.1002/adfm.201103119
4. J. Müller, U. Schröder, T. S. Böscke, I. Müller, U. Böttger, L. Wilde, J. Sundqvist, M. Lemberger, P. Kücher, T. Mikolajick, and L. Frey, J. Appl. Phys. 110, 114113 (2011). 10.1063/1.3667205
5. S. Mueller, C. Adelmann, A. Singh, S. Van Elshocht, U. Schroeder, and T. Mikolajick, ECS J. Solid State Sci. and Technol. 1, N123 (2012). 10.1149/2.002301jss
6. J. Müller, T. S. Böscke, U. Schröder, R. Hoffmann, T. Mikolajick, and L. Frey, IEEE Electron Device Lett. 33, 185 (2012). 10.1109/LED.2011.2177435
7. M. H. Park, H. J. Kim, Y. J. Kim, W. Lee, H. K. Kim, and C. S. Hwang, Appl. Phys. Lett. 102, 112914 (2013). 10.1063/1.4798265
8. M. H. Park, H. J. Kim, Y. J. Kim, W. Jeon, T. Moon, and C. S. Hwang, Phys. Status Solidi RRL 6, 532 (2014). 10.1002/pssr.201409017
9. T. Watanabe, S. Hoffmann-Eifert, F. Peter, S. Mi, C. Jia, C. S. Hwang, and R. Waser, J. Electrochem. Soc. 154, G262 (2007). 10.1149/1.2789295 (Pubitemid 350015363)
10. T. Watanabe, S. Hoffmann-Eifert, C. S. Hwang, and R. Waser, J. Electrochem. Soc. 155, D715 (2008). 10.1149/1.2977717
11. T. Watanabe, S. Hoffmann-Eifert, S. Mi, C. Jia, R. Waser, and C. S. Hwang, J. Appl. Phys. 101, 014114 (2007). 10.1063/1.2422777 (Pubitemid 46120668)
12. D. S. Jeong, R. Thomas, R. S. Katiyar, J. F. Scott, H. Kohlstedt, A. Petraru, and C. S. Hwang, Rep. Prog. Phys. 75, 076502 (2012). 10.1088/0034-4885/75/7/076502
13. J. E. Lowther, J. K. Dewhurst, J. M. Leger, and J. Haines, Phys. Rev. B 60, 14485 (1999). 10.1103/PhysRevB.60.14485
14. M. H. Park, H. J. Kim, Y. J. Kim, W. Lee, T. Moon, and C. S. Hwang, Appl. Phys. Lett. 102, 242905 (2013). 10.1063/1.4811483
15. M. H. Park, H. J. Kim, Y. J. Kim, T. Moon, and C. S. Hwang, Appl. Phys. Lett. 104, 072901 (2014). 10.1063/1.4866008
16. S. W. Lee, J. H. Han, S. Han, W. Lee, J. H. Jang, M. Seo, S. K. Kim, C. Dussarrat, J. Gatineau, Y.-S. Min, and C. S. Hwang, Chem. Mater. 23, 2227 (2011). 10.1021/cm2002572
17. T. Nakamura, Y. Nakao, A. Kamisawa, and H. Takasu, Jpn. J. Appl. Phys. 33, 5207 (1994). 10.1143/JJAP.33.5207
18. P. D. Lomenzo, P. Zhao, Q. Takmeel, S. Moghaddam, T. Nishida, M. Nelson, C. M. Fancher, E. D. Grimley, X. Sang, J. M. LeBeau, and J. L. Jones, J. Vac. Sci. Technol., B 32, 03D123 (2014). 10.1116/1.4873323
19. I. Barin, Thermochemical Data of Pure Substances (VCH, Weinheim, Germany, 1989).
20. See http://srdata.nist.gov/xps/ for NIST X-ray Photoelectron Spectroscopy Database, Version 4.1 (National Institute of Standards and Technology, Gaithersburg, 2012).
21. W. D. Nix and B. M. Clemens, J. Mater. Res. 14, 3467 (1999). 10.1557/JMR.1999.0468
22. See supplementary material at http://dx.doi.org/10.1063/1.4893376 E-APPLAB-105-065433 for the SEM images used for the grain size analysis and the result of peak analysis on GIXRD pattern of HZO films on Ir and TiN electrode.
23. M. W. Pitcher, S. V. Ushakov, A. Navrotsky, B. F. Woodfield, G. Li, and J. Boerio-Goates, J. Am. Ceram. Soc. 88,
24. M. Shandalov and P. C. Mclntyre, J. Appl. Phys. 106, 084322 (2009). 10.1063/1.3243077
25. D. Zhou, J. Xu, Q. Li, Y. Guan, F. CaO, X. Dong, T. Schenk, and U. Schröder, Appl. Phys. Lett. 103, 192904 (2013). 10.1063/1.4829064