Ferroelectricity in gd-doped HfO2 Thin Films

ECS Journal of Solid State Science and Technology

Volumn 1, Issue 6, 2012, Pages

  Mueller, S ^a   Adelmann, C ^b   Singh, A ^a   Van Elshocht, S ^b   Schroeder, U ^a   Mikolajicka, T ^a,c  

^a NAMLAB GGMBH   (Germany)

^b IMEC   (Belgium)

^c DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84887445256     PISSN: 21628769     EISSN: 21628777     Source Type: Journal    
DOI: 10.1149/2.002301jss     Document Type: Article

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