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Applied Physics Letters

Volumn 102, Issue 24, 2013, Pages

Evolution of phases and ferroelectric properties of thin Hf 0.5Zr0.5O2 films according to the thickness and annealing temperature

(6) Hyuk Park, Min a Joon Kim, Han a Jin Kim, Yu a Lee, Woongkyu a Moon, Taehwan a Seong Hwang, Cheol a

a Seoul National University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; FERROELECTRIC PROPERTY; MONOCLINIC PHASIS; ORTHORHOMBIC PHASE; REMANANT POLARIZATION;

FERROELECTRICITY; HAFNIUM; ZIRCONIUM;

FERROELECTRIC FILMS;

EID: 84879831186 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.4811483 Document Type: Article

Times cited : (597)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.