Ferroelectric properties and switching endurance of Hf0.5Zr0.5O2 films on TiN bottom and TiN or RuO2 top electrodes

Physica Status Solidi - Rapid Research Letters

Volumn 8, Issue 6, 2014, Pages 532-535

  Park, Min Hyuk ^a   Kim, Han Joon ^a   Kim, Yu Jin ^a   Jeon, Woojin ^a   Moon, Taehwan ^a   Hwang, Cheol Seong ^a  

^a Seoul National University   (South Korea)

Author keywords

Endurance switching; Ferroelectric capacitors; TiN electrodes

Indexed keywords

CAPACITORS; ELECTRODES; FERROELECTRICITY; HAFNIUM; RUTHENIUM ALLOYS; TITANIUM NITRIDE; ZIRCONIUM;

BOTTOM ELECTRODES; ELECTRIC CYCLING; FERROELECTRIC CAPACITORS; FERROELECTRIC PROPERTY; POST-ANNEALING TEMPERATURE; TIN ELECTRODES;

FERROELECTRIC FILMS;

EID: 84902654990     PISSN: 18626254     EISSN: 18626270     Source Type: Journal    
DOI: 10.1002/pssr.201409017     Document Type: Article

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