Growth behavior of atomic-layer-deposited Pb(Zr,Ti)Ox thin films on planar substrate and three-dimensional hole structures

Journal of the Electrochemical Society

Volumn 155, Issue 11, 2008, Pages

  Watanabe, Takayuki ^a   Hoffmann Eifert, Susanne ^a   Hwang, Cheol Seong ^b   Waser, Rainer ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

LEAD; LEAD ALLOYS;

ATOMIC-LAYER-DEPOSITED; GROWTH BEHAVIOR;

ZIRCONIUM;

EID: 52649113199     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2977717     Document Type: Article

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