메뉴 건너뛰기




Volumn 9, Issue 1, 2014, Pages

Ab initio electronic properties of dual phosphorus monolayers in silicon

Author keywords

Ab initio; Bilayers; Density functional theory; Phosphorus in silicon

Indexed keywords

CALCULATIONS; ELECTRONIC PROPERTIES; MONOLAYERS; PHOSPHORUS; QUANTUM CHEMISTRY; SILICON;

EID: 84908394758     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-9-443     Document Type: Article
Times cited : (4)

References (28)
  • 3
    • 0024301536 scopus 로고
    • Delta-type doping profiles in silicon
    • 10.1016/0169-4332(89)90897-0
    • Eisele I: Delta-type doping profiles in silicon.Appl Surf Sci 1989, 36:39–51. 10.1016/0169-4332(89)90897-0
    • (1989) Appl Surf Sci , vol.36 , pp. 39-51
    • Eisele, I.1
  • 4
    • 0346152497 scopus 로고
    • Electrical transport between delta layers in silicon
    • 10.1063/1.352300
    • Kiunke W, Hammerl E, Eisele I: Electrical transport between delta layers in silicon.J Appl Phys 1992,72(8):3602. 10.1063/1.352300
    • (1992) J Appl Phys , vol.72 , Issue.8 , pp. 3602
    • Kiunke, W.1    Hammerl, E.2    Eisele, I.3
  • 5
    • 33645498126 scopus 로고    scopus 로고
    • Subband and transport calculations in double n-type δ-doped quantum wells in Si
    • 10.1063/1.2168024
    • Rodriguez-Vargas I, Gaggero-Sager LM: Subband and transport calculations in double n-typeδ-doped quantum wells in Si.J Appl Phys 2006, 99:033702. 10.1063/1.2168024
    • (2006) J Appl Phys , vol.99 , pp. 033702
    • Rodriguez-Vargas, I.1    Gaggero-Sager, L.M.2
  • 6
    • 84872865872 scopus 로고    scopus 로고
    • Intel enters the third dimension
    • Cartwright J: Intel enters the third dimension.Nature News 2011. doi:10.1038/news.2011.274
    • (2011) Nature News
    • Cartwright, J.1
  • 7
    • 79551686303 scopus 로고    scopus 로고
    • Dual-temperature encapsulation of phosphorus in germanium δ-layers toward ultra-shallow junctions
    • 10.1016/j.jcrysgro.2010.12.046
    • Scappucci G, Capellini G, Klesse WM, Simmons MY: Dual-temperature encapsulation of phosphorus in germaniumδ-layers toward ultra-shallow junctions.J Cryst Growth 2011, 316:81–84. 10.1016/j.jcrysgro.2010.12.046
    • (2011) J Cryst Growth , vol.316 , pp. 81-84
    • Scappucci, G.1    Capellini, G.2    Klesse, W.M.3    Simmons, M.Y.4
  • 8
    • 79958809301 scopus 로고    scopus 로고
    • A complete fabrication route for atomic-scale, donor-based devices in single-crystal germanium
    • 10.1021/nl200449v
    • Scappucci G, Cappellini G, Johnston B, Klesse WM, Miwa JA, Simmons MY: A complete fabrication route for atomic-scale, donor-based devices in single-crystal germanium.Nano Lett 2011, 11:2272–2279. 10.1021/nl200449v
    • (2011) Nano Lett , vol.11 , pp. 2272-2279
    • Scappucci, G.1    Cappellini, G.2    Johnston, B.3    Klesse, W.M.4    Miwa, J.A.5    Simmons, M.Y.6
  • 9
    • 80052182984 scopus 로고    scopus 로고
    • Phosphorus atomic layer doping of germanium by the stacking of multiple δ layers
    • 10.1088/0957-4484/22/37/375203
    • Scappucci G, Capellini G, Klesse WM, Simmons MY: Phosphorus atomic layer doping of germanium by the stacking of multipleδlayers.Nanotechnology 2011, 22:375203. 10.1088/0957-4484/22/37/375203
    • (2011) Nanotechnology , vol.22 , pp. 375203
    • Scappucci, G.1    Capellini, G.2    Klesse, W.M.3    Simmons, M.Y.4
  • 10
    • 15744388510 scopus 로고    scopus 로고
    • Theoretical study of phosphorous δ-doped silicon for quantum computing
    • Qian G, Chang Y-C, Tucker JR: Theoretical study of phosphorousδ-doped silicon for quantum computing.Phys Rev B 2005, 71:045309.
    • (2005) Phys Rev B , vol.71 , pp. 045309
    • Qian, G.1    Chang, Y.-C.2    Tucker, J.R.3
  • 12
    • 70350234825 scopus 로고    scopus 로고
    • A study of temperature-dependent properties of n-type δ-doped si band-structures in equilibrium
    • Tsinghua University, Beijing: arXiv:1003.4926v1 [cond-mat.mtrl-sci]
    • Ryu H, Lee S, Klimeck G: A study of temperature-dependent properties of n-typeδ-doped si band-structures in equilibrium. In Proceedings of the 13th International Workshop on Computational Electronics. Beijing: Tsinghua University; 2009:1–4. arXiv:1003.4926v1 [cond-mat.mtrl-sci]
    • (2009) Proceedings of the 13th International Workshop on Computational Electronics , pp. 1-4
    • Ryu, H.1    Lee, S.2    Klimeck, G.3
  • 14
    • 79251541175 scopus 로고    scopus 로고
    • Phosphorus δ-doped silicon: mixed-atom pseudopotentials and dopant disorder effects
    • 10.1088/0957-4484/22/6/065701
    • Carter DJ, Marks NA, Warschkow O, McKenzie DR: Phosphorusδ-doped silicon: mixed-atom pseudopotentials and dopant disorder effects.Nanotechnology 2011, 22:065701. 10.1088/0957-4484/22/6/065701
    • (2011) Nanotechnology , vol.22 , pp. 065701
    • Carter, D.J.1    Marks, N.A.2    Warschkow, O.3    McKenzie, D.R.4
  • 15
    • 84860262684 scopus 로고    scopus 로고
    • Effective mass theory of monolayer δ doping in the high-density limit
    • arXiv:1201.3750v1 [cond-mat.mtrl-sci]
    • Drumm DW, Hollenberg LCL, Simmons MY, Friesen M: Effective mass theory of monolayerδdoping in the high-density limit.Phys Rev B 2012,85(15):155419. arXiv:1201.3750v1 [cond-mat.mtrl-sci]
    • (2012) Phys Rev B , vol.85 , Issue.15 , pp. 155419
    • Drumm, D.W.1    Hollenberg, L.C.L.2    Simmons, M.Y.3    Friesen, M.4
  • 17
    • 84893046714 scopus 로고    scopus 로고
    • Electronic properties of δ-doped Si:P and Ge:P layers in the high-density limit using a Thomas-Fermi method
    • Smith JS, Cole JH, Russo SP: Electronic properties ofδ-doped Si:P and Ge:P layers in the high-density limit using a Thomas-Fermi method.Phys Rev B 2014, 89:035306.
    • (2014) Phys Rev B , vol.89 , pp. 035306
    • Smith, J.S.1    Cole, J.H.2    Russo, S.P.3
  • 18
    • 82655166221 scopus 로고    scopus 로고
    • Electronic structure of realistically extended atomistically resolved disordered Si:P δ-doped layers
    • Lee S, Ryu H, Campbell H, Hollenberg LCL, Simmons MY, Klimeck G: Electronic structure of realistically extended atomistically resolved disordered Si:Pδ-doped layers.Phys Rev B 2011, 84:205309.
    • (2011) Phys Rev B , vol.84 , pp. 205309
    • Lee, S.1    Ryu, H.2    Campbell, H.3    Hollenberg, L.C.L.4    Simmons, M.Y.5    Klimeck, G.6
  • 19
    • 84867825805 scopus 로고    scopus 로고
    • Electronic properties of multiple adjacent δ-doped Si:P layers: the approach to monolayer confinement
    • Budi A, Drumm DW, Per MC, Tregonning A, Russo SP, Hollenberg LCL: Electronic properties of multiple adjacentδ-doped Si:P layers: the approach to monolayer confinement.Phys Rev B 2012,86(16):165123.
    • (2012) Phys Rev B , vol.86 , Issue.16 , pp. 165123
    • Budi, A.1    Drumm, D.W.2    Per, M.C.3    Tregonning, A.4    Russo, S.P.5    Hollenberg, L.C.L.6
  • 22
    • 84919898991 scopus 로고    scopus 로고
    • Drumm DW: Physics of low-dimensional nano structures. PhD thesis, The University of Melbourne, 2012
    • Drumm DW: Physics of low-dimensional nano structures.PhD thesis, The University of Melbourne, 2012
  • 23
    • 84872909249 scopus 로고    scopus 로고
    • Electronic structure of two interacting phosphorus δ-doped layers in silicon
    • Carter DJ, Warschkow O, Marks NA, Mackenzie DR: Electronic structure of two interacting phosphorusδ-doped layers in silicon.Phys Rev B 2013, 87:045204.
    • (2013) Phys Rev B , vol.87 , pp. 045204
    • Carter, D.J.1    Warschkow, O.2    Marks, N.A.3    Mackenzie, D.R.4
  • 24
    • 0032116551 scopus 로고    scopus 로고
    • Prospects for atomically ordered device structures based on STM lithography
    • Tucker JR, Shen T-C: Prospects for atomically ordered device structures based on STM lithography.Solid State Electron 1998,42(7–8):1061–1067.
    • (1998) Solid State Electron , vol.42 , Issue.7-8 , pp. 1061-1067
    • Tucker, J.R.1    Shen, T.-C.2
  • 27
    • 37149010818 scopus 로고    scopus 로고
    • Surface gate and contact alignment for buried, atomically precise scanning tunneling microscopy-ppatterned devices
    • 10.1116/1.2781512
    • Fuechsle M, Ruess FJ, Reusch TCG, Mitic M, Simmons MY: Surface gate and contact alignment for buried, atomically precise scanning tunneling microscopy-ppatterned devices.J Vac Sci Tech B 2007,25(6):2562–2567. 10.1116/1.2781512
    • (2007) J Vac Sci Tech B , vol.25 , Issue.6 , pp. 2562-2567
    • Fuechsle, M.1    Ruess, F.J.2    Reusch, T.C.G.3    Mitic, M.4    Simmons, M.Y.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.