Study on the effect of heat treatment conditions on metalorganic-chemical-vapor-deposited ferroelectric Hf0.5Zr0.5O2thin film on Ir electrode

Japanese Journal of Applied Physics

Volumn 53, Issue 9, 2014, Pages

  Shimizu, Takao ^a   Yokouchi, Tatsuhiko ^a   Shiraishi, Takahisa ^a   Oikawa, Takahiro ^a   Rama Krishnan, P S Sankara ^a   Funakubo, Hioshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FERROELECTRICITY; HAFNIUM OXIDES; HEAT TREATMENT; LOW TEMPERATURE OPERATIONS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; TEMPERATURE; VOLUME FRACTION;

CHEMICAL VAPOR DEPOSITED; EFFECT OF HEAT TREATMENTS; FERROELECTRIC PROPERTY; HEAT TREATMENT CONDITIONS; HEAT-TREATMENT DURATION; HIGH DIELECTRIC CONSTANTS; INTERMEDIATE HEAT TREATMENT; POST HEAT-TREATMENT;

FERROELECTRIC FILMS;

EID: 84908092541     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.7567/JJAP.53.09PA04     Document Type: Conference Paper

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