Hafnium oxide based CMOS compatible ferroelectric materials

ECS Journal of Solid State Science and Technology

Volumn 2, Issue 4, 2013, Pages

  Schroeder, U ^a   Mueller, S ^a   Mueller, J ^b   Yurchuk, E ^a   Martin, D ^a   Adelmann, C ^c   Schloesser, T ^d   Van Bentum, R ^d   Mikolajick, T ^a,e  

^a NAMLAB GGMBH   (Germany)

^b Fraunhofer Center Nanoelectronic Technologies   (Germany)

^c IMEC   (Belgium)

^d GLOBALFOUNDRIES   (Germany)

^e DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84887481596     PISSN: 21628769     EISSN: 21628777     Source Type: Journal    
DOI: 10.1149/2.010304jss     Document Type: Article

References (21)

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