Heat treatment of nanocrystalline TiN films deposited by unbalanced magnetron sputtering

Surface and Coatings Technology

Volumn 200, Issue 14-15, 2006, Pages 4291-4299

  Huang, Jia Hong ^a   Yu, Kae Jy ^a   Sit, P ^b   Yu, Ge Ping ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Heat treatment; Residual stress; TiN; Unbalanced magnetron sputtering

Indexed keywords

CRYSTAL MICROSTRUCTURE; HEAT TREATMENT; KINETIC ENERGY; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; OXIDATION; RESIDUAL STRESSES; SILICON WAFERS; SURFACE ROUGHNESS; TEXTURES; THERMODYNAMICS; THIN FILMS;

NANOCRYSTALLINE FILMS; UNBALANCED MAGNETRON SPUTTERING;

TITANIUM NITRIDE;

CRYSTAL MICROSTRUCTURE; HEAT TREATMENT; KINETIC ENERGY; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; OXIDATION; RESIDUAL STRESSES; SILICON WAFERS; SURFACE ROUGHNESS; TEXTURES; THERMODYNAMICS; THIN FILMS; TITANIUM NITRIDE;

EID: 33644700171     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.02.147     Document Type: Article

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