Area-selective ALD of TiO2 nanolines with electron-beam lithography

Journal of Physical Chemistry C

Volumn 118, Issue 40, 2014, Pages 23306-23312

  Huang, Jie ^a   Lee, Mingun ^a,b   Lucero, Antonio ^a   Cheng, Lanxia ^a   Kim, Jiyoung ^a  

^a The University of Texas at Dallas   (United States)

^b Dongjin Semichem Co Ltd   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

NANOLINES; TIO;

EID: 84908072577     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp5037662     Document Type: Article

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