Electron-beam-induced damage in self-assembled monolayers

Journal of Physical Chemistry

Volumn 100, Issue 39, 1996, Pages 15900-15909

  Seshadri, Kannan ^a   Froyd, Karl ^a   Parikh, Atul N ^b   Allara, David L ^b   Lercel, Michael J ^a,b   Craighead, Harold G ^b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b Department of Population Medicine and Diagnostic Sciences   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33751155891     PISSN: 00223654     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp960705g     Document Type: Article

References (47)

1. Mallon, J. In Nanotechnology; Crandall, B. C.; Lewis, J., Eds.; The MIT Press: Cambridge, 1992; pp 215-239.
2. Drexler, K. E.; Peterson, C. Unbounding the Future: The Nanotechnology Revolution; William Morrow and Co., Inc.: New York, 1991.
3. Gentili, M.; Giovanella, C.; Selci, S. Nanolithography: A Border-land between STM, EB, IB and X-Ray Lithographies; Kluwer Academic Publishers: Dordrecht, The Netherlands, 1994.
4. Chang, T. H. P.; Muray, L. P.; Staufer, U.; McCord, M. A.; Kern, D. P. In Technology of Proximal Probe Lithography; Marrian, C. R. K., Ed.; SPIE Optical Engineering Press: Bellingham, WA, 1993; pp 127-154.
5. Ulman, A. Introduction to Ultrathin Organic Films: from Langmuir-Blodgett to Self-Assembly; Academic: San Diego, CA, 1991.
6. Ulman, A. Chem. Rev. 1996, 96, 1533-1554.
7. Tiberio, R. C.; Craighead, H. G.; Lercel, M. J.; Lau, T.; Sheen, C. W.; Allara, D. L. Appl. Phys. Lett. 1993, 62, 476.
8. Lercel, M. J.; Tiberio, R. C.; Chapman, P. F.; Craighead, H. G.; Sheen, C. W.; Parikh, A. N.; Allara, D. L. J. Vac. Sci. Technol. 1993, B11, 2823-2828.
9. Lercel, M. J.; Redinbo, G. F.; Pardo, F. D.; Rooks, M.; Tiberio, R. C.; Simpson, P.; Craighead, H. G.; Sheen, C. W.; Parikh, A. N.; Allara, D. L. J. Vac. Sci. Technol. 1994, B12, 3603-3667.
10. Lercel, M. J.; Redinbo, G. F.; Rooks, M.; Tiberio, R. C.; Craighead, H. G.; Sheen, C. W.; Allara, D. L. Microelectron. Eng. 1995, 27, 43-46.
11. Lercel, M. J.; Rooks, M.; Tiberio, R. C.; Craighead, H. G.; Sheen, C. W.; Parikh, A. N.; Allara, D. L. J. Vac. Sci. Technol. 1995, B13, 1139-1143.
12. Lercel, M. J.; Craighead, H. G.; Parikh, A. N.; Seshadri, K.; Allara, D. L. Appl. Phys. Lett. 1996, 68, 1504-6.
13. Salovey, R. In The Radiation Chemistry of Macromolecules; Dole, M., Ed.; Academic Press: New York, 1973; pp 307-312.
14. Chappas, W. J.; Silverman, J. Radiat. Phys. Chem. 1980, 16, 437-443.
15. Földiák, G. Radiation Chemistry of Hydrocarbons; Elsevier Scientific Publishing Company: Amsterdam, 1981.
16. Parikh, A. N.; Allara, D. L.; Azouz, I. B.; Rondelez, F. J. Phys. Chem. 1994, 98, 7577-7590.
17. Kisza, M.; Maternia, Z.; Radzimski, Z. J. Phys. D: Appl. Phys. 1981, 14, 907-912.
18. Sheen, C. W.; Shi, J.; Parikh, A. N.; Martensson, J.; Allara, D. L. J. Am. Chem. Soc. 1992, 114, 1514.
19. SAT This equation and eq 1 give nearly identical values for the critical dose. However, since the specific kinetic rate laws describing the critical dose behavior are expected to be quite complicated because of the multiple contributing processes and the complexities of the solid state matrix, no attempt was made to determine a fundamental rate law. On this basis, the tanh function, which contains multiple exponential terms, was chosen for the fitting.
20. Seah, M. P. In Practical Surface Analysis; Briggs, D., Seah, M. P., Eds.; John Wiley & Sons: Chichester, England, 1990; Vol. 1, (Auger and X-ray Photoelectron Spectroscopy); Chapter 5.
21. Laibinis, P. E.; Bain, C. D.; Whitesides, G. M. J. Phys. Chem. 1991, 95, 7017-7021.
22. Moulder, J. F.; Stickle, W. F.; Sobol, P. E.; Bomben, K.-D.Hand-book of X-ray Photoelectron Spectroscopy; Perkin Elmer: Eden Prarie, MN, 1992.
23. Briggs, D. In Practical Surface Analysis; Briggs, D., Seah, M. P., Eds.; John Wiley & Sons: Chichester, England, 1990; Vol. 1, (Auger and X-ray Photoelectron Spectroscopy); Chapter 9, pp 469.
24. A detailed investigation has been conducted on the role of X-rays in damage to trifluoroacetamide-terminated monolayers on different substrates, and the results are consistent with the premise that electrons scattered from the film are responsible for damage rather than the X-rays. Differences in the loss of fluorine atoms correlates with the efficiency of secondary electron generation from a given substrate. See: Graham, R. L.; Bain, C. D.; Biebuyck, H. A.; Laibinis, P. E.; Whitesides, G. M. J. Phys. Chem. 1993, 97, 9456-9464.
25. 2 surfaces were attributed to the differing band structures of the two substrates and the relative positions of the adsorbed species' ionization potentials. In brief, electron impact first causes bonds to fragment to radicals, a process which, according to our above conclusion based on electron yields and distributions, should not exhibit much substrate dependence. However, the desorption yields will be strongly affected by the ability of the substrate valence band electrons to neutralize any ions formed in the initial process. In the present case of irradiation of a cross-linked SAM, since for both substrates a very similar nonvolatile carbonaceous residue is the primary product with desorption a minor product channel, the substrate-dependent neutralization efficiency should not be a controlling factor.
26. Collins, R. W.; Kim, Y. T.; Shi, J.; Allara, D. L. In Characterization of Organic Thin Films; Ulman, A., Ed.; Manning: Greenwich, CT, 1995; pp 33-55.
27. Atre, S. V.; Liedberg, B.; Allara, D. L. Langmuir 1995, 11, 3882-3893.
28. Cassie, A. B. D.; Baxter, S. Trans. Faraday Soc. 1944, 40, 546.
29. Israelachvili, J. N.; Gee, M. L. Langmuir 1988, 5, 288-289.
30. Baer, D. R.; Engelhard, M. H.; Schulte, D. W.; Guenther, D. E.; Wang, L.-Q.; Rieke, P. C. J. Vac. Sci. Technol. 1994, A12, 2478-2485.
31. Rowntree, P.; Dugal, P.-C.; Hunting, D.; Sanche, L. J. Phys. Chem. 1996, 100, 4546-4550.
32. Allara, D. L.; Nuzzo, R. G. Langmuir 1985, 1, 52.
33. López, G. P.; Biebuyck, H. A.; Whitesides, G. M. Langmuir 1993, 9, 1513-1516.
34. Wollman, E. W.; Frisbie, C. D.; Wrighton, M. S. Langmuir 1993, 9, 1517-1520.
35. Joy, D. C.; Luo, S. Scanning 1989, 11, 176.
36. Bethe, H. Ann. Phys. 1930, 5, 325.
37. Bethe, H.; Ashkin, J. In Experimental Nuclear Physics; Segrè, E. Ed.; Wiley: New York, 1953; p 252.
38. Burnham, N. A.; Dominguez, D. D.; Mowery, R. L.; Colton, R. J. Phys. Rev. Lett. 1990, 64, 1931-1934.
39. Miller, A. A.; Lawton, E. J.; Balwit, J. S. J. Phys. Chem. 1956, 60, 599.
40. Experiments are in progress using forward recoil elastic scattering (FRES) analysis to determine the H atom content in these films.
41. Michaels, A. S.; Bixler, H. J. J. Polym. Sci. 1961, 50, 393.
42. Matsuo, H.; Dole, M. J. Phys. Chem. 1959, 63, 837.
43. Giberson, R. C. J. Phys. Chem. 1962, 66, 463.
44. Kimura, K.; Ogawa, M.; Matsoi, M.; Karasawa, K.; Imamura, M.; Tabata, Y.; Oshima, K. J. Chem. Phys. 1975, 63, 1797.
45. 2/Ti cases. See also footnote 25.
46. Matsunami, N.; Yamamura, Y.; Itikawa, Y.; Itoh, N.; Kazumata, Y.; Miyagawa, S.; Morita, K.; Shimizu, R.; Tawara, H. At. Data Nucl. Data Tables 1984, 31, 1.
47. Kittel, C. Introduction to Solid State Physics; John Wiley and Sons: New York, 1986; p 55.