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Volumn 100, Issue 39, 1996, Pages 15900-15909

Electron-beam-induced damage in self-assembled monolayers

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EID: 33751155891     PISSN: 00223654     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp960705g     Document Type: Article
Times cited : (119)

References (47)
  • 1
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    • Crandall, B. C.; Lewis, J., Eds.; The MIT Press: Cambridge
    • Mallon, J. In Nanotechnology; Crandall, B. C.; Lewis, J., Eds.; The MIT Press: Cambridge, 1992; pp 215-239.
    • (1992) Nanotechnology , pp. 215-239
    • Mallon, J.1
  • 6
    • 0345979435 scopus 로고    scopus 로고
    • Ulman, A. Chem. Rev. 1996, 96, 1533-1554.
    • (1996) Chem. Rev. , vol.96 , pp. 1533-1554
    • Ulman, A.1
  • 19
    • 85033051054 scopus 로고    scopus 로고
    • note
    • SAT This equation and eq 1 give nearly identical values for the critical dose. However, since the specific kinetic rate laws describing the critical dose behavior are expected to be quite complicated because of the multiple contributing processes and the complexities of the solid state matrix, no attempt was made to determine a fundamental rate law. On this basis, the tanh function, which contains multiple exponential terms, was chosen for the fitting.
  • 20
    • 0000503141 scopus 로고
    • Briggs, D., Seah, M. P., Eds.; John Wiley & Sons: Chichester, England, Auger and X-ray Photoelectron Spectroscopy; Chapter 5
    • Seah, M. P. In Practical Surface Analysis; Briggs, D., Seah, M. P., Eds.; John Wiley & Sons: Chichester, England, 1990; Vol. 1, (Auger and X-ray Photoelectron Spectroscopy); Chapter 5.
    • (1990) Practical Surface Analysis , vol.1
    • Seah, M.P.1
  • 23
    • 0003828439 scopus 로고
    • Briggs, D., Seah, M. P., Eds.; John Wiley & Sons: Chichester, England, Auger and X-ray Photoelectron Spectroscopy; Chapter 9
    • Briggs, D. In Practical Surface Analysis; Briggs, D., Seah, M. P., Eds.; John Wiley & Sons: Chichester, England, 1990; Vol. 1, (Auger and X-ray Photoelectron Spectroscopy); Chapter 9, pp 469.
    • (1990) Practical Surface Analysis , vol.1 , pp. 469
    • Briggs, D.1
  • 24
    • 33751385294 scopus 로고
    • A detailed investigation has been conducted on the role of X-rays in damage to trifluoroacetamide-terminated monolayers on different substrates, and the results are consistent with the premise that electrons scattered from the film are responsible for damage rather than the X-rays. Differences in the loss of fluorine atoms correlates with the efficiency of secondary electron generation from a given substrate. See: Graham, R. L.; Bain, C. D.; Biebuyck, H. A.; Laibinis, P. E.; Whitesides, G. M. J. Phys. Chem. 1993, 97, 9456-9464.
    • (1993) J. Phys. Chem. , vol.97 , pp. 9456-9464
    • Graham, R.L.1    Bain, C.D.2    Biebuyck, H.A.3    Laibinis, P.E.4    Whitesides, G.M.5
  • 25
    • 33751364857 scopus 로고
    • 2 surfaces were attributed to the differing band structures of the two substrates and the relative positions of the adsorbed species' ionization potentials. In brief, electron impact first causes bonds to fragment to radicals, a process which, according to our above conclusion based on electron yields and distributions, should not exhibit much substrate dependence. However, the desorption yields will be strongly affected by the ability of the substrate valence band electrons to neutralize any ions formed in the initial process. In the present case of irradiation of a cross-linked SAM, since for both substrates a very similar nonvolatile carbonaceous residue is the primary product with desorption a minor product channel, the substrate-dependent neutralization efficiency should not be a controlling factor.
    • (1985) Surf. Sci. , vol.159 , pp. 466-484
    • Hayes, T.R.1    Evans, J.F.2
  • 40
    • 85033037480 scopus 로고    scopus 로고
    • note
    • Experiments are in progress using forward recoil elastic scattering (FRES) analysis to determine the H atom content in these films.
  • 45
    • 85033072110 scopus 로고    scopus 로고
    • note
    • 2/Ti cases. See also footnote 25.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.