Resolution limits of electron-beam lithography toward the atomic scale

Nano Letters

Volumn 13, Issue 4, 2013, Pages 1555-1558

  Manfrinato, Vitor R ^a   Zhang, Lihua ^b   Su, Dong ^b   Duan, Huigao ^c   Hobbs, Richard G ^a   Stach, Eric A ^b   Berggren, Karl K ^a  

^a USA   (United States)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

^c HUNAN UNIVERSITY   (China)

Author keywords

EELS; electron beam lithography; high voltage electron beam lithography; hydrogen silsesquioxane; point spread function; STEM lithography

Indexed keywords

ABERRATION-CORRECTED; ATOMIC SCALE; FEATURE SIZES; HIGH VOLTAGE; HYDROGEN SILSESQUIOXANE; POINT-SPREAD FUNCTION; RESOLUTION LIMITS; SCANNING TRANSMISSION ELECTRON MICROSCOPES;

ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISSIPATION; OPTICAL TRANSFER FUNCTION; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON BEAM LITHOGRAPHY;

1,3-BIS(1,1,3,3,5,5-HEXAETHOXY-1,3,5-TRISILACYCLOHEXYL)PROPANE; HYDROGEN; ORGANOSILICON DERIVATIVE; 1,3 BIS(1,1,3,3,5,5 HEXAETHOXY 1,3,5 TRISILACYCLOHEXYL)PROPANE;

CHEMISTRY; ELECTRON; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRONICS; SCANNING TRANSMISSION ELECTRON MICROSCOPY; ARTICLE;

ELECTRONICS; ELECTRONS; HYDROGEN; MICROSCOPY, ELECTRON, SCANNING TRANSMISSION; ORGANOSILICON COMPOUNDS; SPECTROSCOPY, ELECTRON ENERGY-LOSS;

EID: 84876067733     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl304715p     Document Type: Article

References (34)

1. Wells, O.; Everhart, T.; Matta, R. IEEE Trans. Electron Devices 1965, ED12 (10) 556-563
2. Broers, A.; Molzen, W.; Cuomo, J.; Wittels, N. Appl. Phys. Lett. 1976, 29 (9) 596-598
3. Isaacson, M.; Murray, A. J. Vac. Sci. Technol. 1981, 19 (4) 1117-1120
4. Yang, J.; Cord, B.; Duan, H.; Berggren, K.; Klingfus, J.; Nam, S.; Kim, K.; Rooks, M. J. Vac. Sci. Technol., B 2009, 27 (6) 2622-2627
5. Cord, B.; Yang, J.; Duan, H.; Joy, D.; Klingfus, J.; Berggren, K. J. Vac. Sci. Technol., B 2009, 27 (6) 2616-2621
6. Duan, H.; Manfrinato, V.; Yang, J.; Winston, D.; Cord, B.; Berggren, K. J. Vac. Sci. Technol., B 2010, 28 (6) C6H11-C6H17
7. Pease, R. F. J. Vac. Sci. Technol., B 2010, 28 (6) C6A1-C6A6
8. Arjmandi, N.; Lagae, L.; Borghs, G. J. Vac. Sci. Technol. B 2009, 27 (4) 1915-1918
9. Howard, R.; Craighead, H.; Jackel, L.; Mankiewich, P.; Feldman, M. J. Vac. Sci. Technol., B 1983, 1 (4) 1101-1104
10. Kyser, D.; Ting, C. J. Vac. Sci. Technol. 1979, 16 (6) 1759-1763
11. Rishton, S.; Kern, D. J. Vac. Sci. Technol., B 1987, 5 (1) 135-141
12. Kyser, D.; Viswanathan, N. J. Vac. Sci. Technol. 1975, 12 (6) 1305-1308
13. Murata, K.; Kyser, D.; Ting, C. J. Appl. Phys. 1981, 52 (7) 4396-4405
14. Olkhovets, A.; Craighead, H. J. Vac. Sci. Technol., B 1999, 17 (4) 1366-1370
15. Namatsu, H.; Yamaguchi, T.; Nagase, M.; Yamazaki, K.; Kurihara, K. Microelectron. Eng. 1998, 42, 331-334
16. Fujita, J.; Ohnishi, Y.; Ochiai, Y.; Matsui, S. Appl. Phys. Lett. 1996, 68 (9) 1297-1299
17. Hu, W.; Sarveswaran, K.; Lieberman, M.; Bernstein, G. J. Vac. Sci. Technol., B 2004, 22 (4) 1711-1716
18. Yang, X.; Xiao, S.; Wu, W.; Xu, Y.; Mountfield, K.; Rottmayer, R.; Lee, K.; Kuo, D.; Weller, D. J. Vac. Sci. Technol., B 2007, 25 (6) 2202-2209
19. Yang, J.; Berggren, K. J. Vac. Sci. Technol., B 2007, 25 (6) 2025-2029
20. Vieu, C.; Carcenac, F.; Pepin, A.; Chen, Y.; Mejias, M.; Lebib, A.; Manin-Ferlazzo, L.; Couraud, L.; Launois, H. Appl. Surf. Sci. 2000, 164, 111-117
21. Yasin, S.; Hasko, D.; Carecenac, F. J. Vac. Sci. Technol., B 2001, 19 (1) 311-313
22. van Dorp, W.; van Someren, B.; Hagen, C.; Kruit, P. Nano Lett. 2005, 5 (7) 1303-1307
23. Ward, D.; Huser, F.; Pauly, F.; Cuevas, J.; Natelson, D. Nat. Nanotechnol. 2010, 5 (10) 732-736
24. Duan, H.; Fernandez-Dominguez, A.; Bosman, M.; Maier, S.; Yang, J. Nano Lett. 2012, 12 (3) 1683-1689
25. Joachim, C.; Gimzewski, J.; Aviram, A. Nature 2000, 408 (6812) 541-548
26. Song, H.; Kim, Y.; Jang, Y.; Jeong, H.; Reed, M.; Lee, T. Nature 2009, 462 (7276) 1039-1043
27. Sarikaya, M.; Tamerler, C.; Jen, A.; Schulten, K.; Baneyx, F. Nat. Mater. 2003, 2 (9) 577-585
28. Duan, H.; Berggren, K. Nano Lett. 2010, 10 (9) 3710-3716
29. Wu, B.; Neureuther, A. J. Vac. Sci. Technol., B 2001, 19 (6) 2508-2511
30. Joy, D. Microbeam Anal. 1995, 4 (3) 125-129
31. Luo, S.; Joy, D. Scanning Microsc. 1990, 127-146
32. Chung, M.; Everhart, T. Phys. Rev. B 1977, 15 (10) 4699-4715
33. Werner, W.; Salvat-Pujol, F.; Smekal, W.; Khalid, R.; Aumayr, F.; Stori, H.; Ruocco, A.; Stefani, G. Appl. Phys. Lett. 2011, 99, 18
34. Werner, W.; Ruocco, A.; Offi, F.; Iacobucci, S.; Smekal, W.; Winter, H.; Stefani, G. Phys. Rev. B 2008, 78, 23