One-step selective chemistry for silicon-on-insulator sensor geometries

Langmuir

Volumn 27, Issue 12, 2011, Pages 7337-7340

  Seitz, Oliver ^a   Fernandes, Poornika G ^a   Mahmud, Gazi A ^a   Wen, Huang Chun ^b   Stiegler, Harvey J ^a   Chapman, Richard A ^a   Vogel, Eric M ^a   Chabal, Yves J ^a  

^a UNIVERSITY OF TEXAS AT DALLAS   (United States)

^b TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE AREA; CHEMICAL PROCESS; ELECTRICAL MEASUREMENT; FIELD EFFECT TRANSISTOR STRUCTURES; FUNCTIONALIZATION PROCESS; REPRODUCIBILITIES; SELECTIVE FUNCTIONALIZATION; SELF-ORGANIZED; SENSOR GEOMETRIES; SI(1 0 0); SILICON ON INSULATOR; TARGET MOLECULE;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CHEMICAL STABILITY; FIELD EFFECT TRANSISTORS; PHOTOELECTRON SPECTROSCOPY; SILICON COMPOUNDS; SILICON OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

MOLECULES;

SILICON;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; INFRARED SPECTROSCOPY; METHODOLOGY; SPECTROSCOPY; X RAY;

MICROSCOPY, ATOMIC FORCE; SILICON; SPECTROSCOPY, FOURIER TRANSFORM INFRARED; SPECTRUM ANALYSIS; X-RAYS;

EID: 79959212606     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la200471b     Document Type: Article

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