Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography

Langmuir

Volumn 20, Issue 9, 2004, Pages 3766-3768

  Mendes, Paula M ^a   Jacke, Susanne ^a   Critchley, Kevin ^b   Plaza, Jose ^a   Chen, Yu ^a   Nikitin, Kirill ^c   Palmer, Richard E ^a   Preece, Jon A ^a   Evans, Stephen D ^b   Fitzmaurice, Donald ^c  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

^b UNIVERSITY OF LEEDS   (United Kingdom)

^c UNIVERSITY COLLEGE DUBLIN   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL REACTIONS; ELECTRON BEAMS; GOLD; LITHOGRAPHY; MONOLAYERS; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

MOLECULAR RECOGNITION; NANOMETER SCALE; NANOPARTICLE PATTERNING; PATTERNING COMPLEX NANOSTRUCTURES;

SILICON WAFERS;

CHEMICAL REACTIONS; ELECTRON BEAMS; GOLD; LITHOGRAPHY; MONOLAYERS; SILICON; SYNTHESIS;

EID: 2342652309     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la049803g     Document Type: Article

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