Progress and future directions for atomic layer deposition and ALD-based chemistry

MRS Bulletin

Volumn 36, Issue 11, 2011, Pages 865-871

  Parsons, Gregory N ^a   George, Steven M ^b   Knez, Mato ^c  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b UNIVERSITY OF COLORADO   (United States)

^c MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

Atomic layer deposition; blend; coating; composite; thin film

Indexed keywords

ATMOSPHERIC PRESSURE; ATOMS; BLENDING; COATINGS; COMPOSITE MATERIALS; FILM GROWTH; FILM THICKNESS; TEMPERATURE; THICKNESS MEASUREMENT; THIN FILMS; ULTRATHIN FILMS; VAPOR DEPOSITION;

ARCHITECTURAL ENGINEERING; CHEMICAL REACTION METHODS; ENERGY APPLICATIONS; MOLECULAR LAYER DEPOSITION; NON-PLANAR SURFACES; ULTRA-THIN FILM COATINGS; VAPOR INFILTRATIONS; WIDE-RANGING APPLICATIONS;

ATOMIC LAYER DEPOSITION;

EID: 82055203185     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: 10.1557/mrs.2011.238     Document Type: Article

References (46)

1. T. Suntola, J. Antson, U.S. Patent 4,058,430 (1977).
2. T. Suntola, Thin Solid Films 216, 84 (1992).
3. R.L. Puurunen, J. Appl. Phys. 97, 52 (2005).
4. S.M. George, Chem. Rev. 110, 111 (2010).
5. Atomic Layer Epitaxy, S. Bedair, Ed. (Elsevier, Amsterdam, 1992), reprinted from Thin Solid Films 225, 1 (1993).
6. K. Mistry, C. Allen, C. Auth, B. Beattie, D. Bergstrom, M. Bost, M. Brazier, M. Buehler, A. Cappellani, R. Chau, C.H. Choi, G. Ding, K. Fischer, T. Ghani, R. Grover, W. Han, D. Hanken, M. Hatttendorf, J. He, J. Hicks, R. Huessner, D. Ingerly, P. Jain, R. James, L. Jong, S. Joshi, C. Kenyon, K. Kuhn, K. Lee, H. Liu, J. Maiz, B. McIntyre, P. Moon, J. Neirynck, S. Pei, C. Parker, D. Parsons, C. Prasad, L. Pipes, M. Prince, P. Ranade, T. Reynolds, J. Sandford, L. Schifren, J. Sebastian, J. Seiple, D. Simon, S. Sivakumar, P. Smith, C. Thomas, T. Troeger, P. Vandervoorn, S. Williams, K. Zawadzki, in 2007 IEEE International Electron Devices Meeting (2007), pp. 247-250.
7. R.M. Wallace, P.C. McIntyre, J. Kim, Y. Nishi, MRS Bull. 34, 493 (2009).
8. Atomic Layer Deposition of Nanostructured Materials, 1 st edition, N. Pinna, M. Knez, Eds. (Wiley-VCH, Weinheim, 2011).
9. J.W. Elam, D. Routkevitch, P.P. Markilovich, S.M. George, Chem. Mater. 15, 3507 (2003).
10. Thermochemical values at O°C from HSC Chemistry 5 (Outokumpu Research Oy, Pori, Finland, 2006).
11. S.M. George, A.W. Ott, J.W. Klaus, J. Phys. Chem. 100, 13121 (1996).
12. K.R. Bray, G.N. Parsons, Phys. Rev. B 65, 8 (2002).
13. F.H. Fabreguette, R.A. Wind, S.M. George, Appl. Phys. Lett. 88, 013116 (2006).
14. K. Kukli, J. Ihanus, M. Ritala, M. Leskelä, Appl. Phys. Lett. 68, 3737 (1996).
15. Y.K. Kim, S.H. Lee, S.J. Choi, H.B. Park, Y.D. Seo, K.H. Chin, D. Kim, J.S. Lim, W.D. Kim, K.J. Nam, M.H. Cho, K.H. Hwang, Y.S. Kim, S.S. Kim, Y.W. Park, J.T. Moon, S.L. Lee, M.Y. Lee, in International Electron Devices Meeting 2000, Technical Digest (IEEE, New York, 2000), pp. 369-372.
16. O. Sneh, R.B. Clark-Phelps, A.R. Londergan, J. Winkler, T.E. Seidel, Thin Solid Films 402, 248 (2002).
17. V.B. Aleskovskii, J. Appl. Chem. USSR 47, 2207 (1974).
18. A.A. Malygin, J. Ind. Eng. Chem. 12, 1 (2006).
19. T. Yoshimura, S. Tatsuura, W. Sotoyama, Appl. Phys. Lett. 59, 482 (1991).
20. S.M. George, B. Yoon, A.A. Dameron, Acc. Chem. Res. 42, 498 (2009).
21. N.M. Adamczyk, A.A. Dameron, S.M. George, Langmuir 24, 2081 (2008).
22. A.A. Dameron, D. Seghete, B.B. Burton, S.D. Davidson, A.S. Cavanagh, J.A. Bertrand, S.A. George, Chem. Mater. 20, 3315 (2008).
23. C.N. McMahon, L. Alemany, R.L. Callender, S.G. Bott, A.R. Barron, Chem. Mater. 11, 3181 (1999).
24. B. Yoon, J.L. O'Patchen, D. Seghete, A.S. Cavanagh, S.M. George, Chem. Vap. Deposition 15, 112 (2009).
25. Q. Peng, B. Gong, R.M. VanGundy, G.N. Parsons, Chem. Mater. 21, 820 (2009).
26. S.M. George, B.H. Lee, B. Yoon, A.I. Abdulagatov, R.A. Hall, J. Nanosci. Nanotechnol. (2011), in press.
27. K.B. Klepper, O. Nilsen, H. Fjellvag, Dalton Trans. 39, 11628 (2010).
28. L.D. Salmi, E. Puukilainen, M. Vehkamaki, M. Heikkila, M. Ritala, Chem. Vap. Deposition 15, 221 (2009).
29. B. Yoon, Y. Lee, A. Derk, C.B. Musgrave, S.M. George, ECS Trans. 33, 191 (2011).
30. X.H. Liang, M. Yu, J.H. Li, Y.B. Jiang, A.W. Weimer, Chem. Commun. 46, 7140 (2009).
31. Y. Qin, Y. Yang, R. Scholz, E. Pippel, X. Lu, M. Knez, Nano Lett. 11, 2503 (2011).
32. B. Gong, Q. Peng, J.S. Jur, C.K. Devine, K. Lee, G.N. Parsons, Chem. Mater. 23 (15), 3476 (2011).
33. S.M. Lee, E. Pippel, U. Gosele, C. Dresbach, Y. Qin, C.V. Chandran, T. Brauniger, G. Hause, M. Knez, Science 324, 488 (2009).
34. C.A. Wilson, R.K. Grubbs, S.M. George, Chem. Mater. 17, 5625 (2005).
35. J.S. Jur, J.C. Spagnola, K. Lee, B. Gong, Q. Peng, G.N. Parsons, Langmuir 26, 8239 (2010).
36. J.C. Spagnola, B. Gong, S.A. Arvidson, J.S. Jur, S.A. Khan, G.N. Parsons, J. Mater. Chem. 20, 4213 (2010).
37. E.E. Jelley, Nature 138, 1009 (1936).
38. L.B. Zhang, A.J. Patil, L. Li, A. Schierhorn, S. Mann, U. Gosele, M. Knez, Angew. Chem. Int. Ed. 48, 4982 (2009).
39. S.-M. Lee, V. Ischenko, E. Pippel, A. Masic, O. Moutanabbir, P. Fratzl, M. Knez, Adv. Funct. Mater. 21, 3047 (2011).
40. S.M. Lee, E. Pippel, O. Moutanabbir, I. Gunkel, T. Thurn-Albrecht, M. Knez, ACS Appl. Mater. Interfaces 2, 2436 (2010).
41. Q. Peng, Y.C. Tseng, S.B. Darling, J.W. Elam, Adv. Mater. 22, 5129 (2010).
42. Q. Peng, Y.C. Tseng, S.B. Darling, J.W. Elam, ACS Nano 5, 4600 (2011).
43. G.W. Bryan, P.E. Gibbs, J. Mar. Biol. Assoc. U.K. 59, 969 (1979).
44. P.E. Gibbs, G.W. Bryan, J. Mar. Biol. Assoc. U.K. 60, 205 (1980).
45. S.-M. Lee, E. Pippel, M. Knez, Chem. Phys. Chem. 12, 791 (2011).
46. Q. Peng, X.Y. Sun, J.C. Spagnola, G.K. Hyde, R.J. Spontak, G.N. Parsons, Nano Letters 7, 719 (2007).