Electron-beam chemical lithography with aliphatic self-assembled monolayers

Angewandte Chemie - International Edition

Volumn 47, Issue 8, 2008, Pages 1421-1424

  Ballav, Nirmalya ^a   Schilp, Soeren ^a   Zharnikov, Michael ^a  

^a UNIVERSITY OF HEIDELBERG   (Germany)

Author keywords

Electron beams; Lithography; Monolayers; Polymer brushes; Self assembly

Indexed keywords

ABS RESINS; CHEMICAL COMPOUNDS; CHEMICAL REACTIONS; ELECTRON ENERGY LEVELS; LITHOGRAPHY; MISSILE BASES;

ELECTRON BEAMS; MONOLAYERS; POLYMER BRUSHES; SELF-ASSEMBLY;

SELF ASSEMBLED MONOLAYERS;

EID: 53249136111     PISSN: 14337851     EISSN: None     Source Type: Journal    
DOI: 10.1002/anie.200704105     Document Type: Article

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