Effects of surface hydrophobization on the growth of self-assembled monolayers on silicon

Langmuir

Volumn 20, Issue 7, 2004, Pages 2701-2706

  Foisner, Johann ^a   Glaser, Andreas ^a   Leitner, Thomas ^a   Hoffmann, Helmuth ^a   Friedbacher, Gernot ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; GROWTH (MATERIALS); INFRARED SPECTROSCOPY; MOLECULES; MONOLAYERS; SELF ASSEMBLY; SILICON;

ALKYLSILOXANE; DEACTIVATION REAGENT; EXTERNAL REFLECTION INFRARED SPECTROSCOPY; IMMERSION; OCTADECYLTRICHLOROSILANE; SELF-ASSEMBLED MONOLAYERS; SUBMONOLAYER COVERAGE; SURFACE HYDROPHOBIZATION;

ORGANIC COMPOUNDS;

SILANE DERIVATIVE; SILICON;

ADSORPTION; ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; HYDROPHOBICITY; SURFACE PROPERTY;

ADSORPTION; HYDROPHOBICITY; MICROSCOPY, ATOMIC FORCE; SILANES; SILICON; SURFACE PROPERTIES;

EID: 1842627563     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la036261e     Document Type: Article

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