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Physical Chemistry Chemical Physics

Volumn 16, Issue 39, 2014, Pages 21804-21811

Effect of low thermal budget annealing on surface passivation of silicon by ALD based aluminum oxide films

(10) Vandana, a Batra, Neha a Gope, Jhuma a Singh, Rajbir a Panigrahi, Jagannath a Tyagi, Sanjay a Pathi, P a Srivastava, S K a Rauthan, C M S a Singh, P K a

a NATIONAL PHYSICAL LABORATORY (India)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84907833771 PISSN: 14639076 EISSN: None Source Type: Journal
DOI: 10.1039/c4cp03430a Document Type: Article

Times cited : (21)

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