Influence of oxygen on the sputtering of aluminum oxide for the surface passivation of crystalline silicon

Solar Energy Materials and Solar Cells

Volumn 95, Issue 1, 2011, Pages 69-72

  Li, Tsu Tsung Andrew ^a   Ruffell, Simon ^a   Tucci, Mario ^b   Mansouli, Yves ^c   Samundsett, Christian ^a   De Iullis, Simona ^b   Serenelli, Luca ^b   Cuevas, Andres ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^b ENEA   (Italy)

^c ECOLE CENTRALE PARIS   (France)

Author keywords

Aluminum oxide; Sputtering; Surface passivation

Indexed keywords

ALUMINUM; OXIDE FILMS; OXIDES; SILICON OXIDES; SPUTTERING;

ALUMINUM OXIDE FILMS; ALUMINUM OXIDES; COMBINED STRUCTURE; CRYSTALLINE SILICONS; INFLUENCE OF OXYGEN; SILICON OXIDE LAYERS; SPUTTERING PROCESS; SURFACE PASSIVATION;

PASSIVATION;

EID: 78149362339     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2010.03.034     Document Type: Article

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