Characteristics of dual-frequency capacitively coupled SF 6/O2 plasma and plasma texturing of multi-crystalline silicon

Chinese Physics B

Volumn 23, Issue 6, 2014, Pages

  Xu, Dong Sheng ^a   Zou, Shuai ^a,b   Xin, Yu ^a   Su, Xiao Dong ^a   Wang, Xu Sheng ^b  

^a SOOCHOW UNIVERSITY   (China)

^b Canadian Solar Inc China   (China)

Author keywords

dual frequency capacitively coupled plasma; electron density; multi crystalline silicon; plasma texturing

Indexed keywords

CARRIER CONCENTRATION; ELECTRON DENSITY MEASUREMENT; INDUCTIVELY COUPLED PLASMA;

CAPACITIVELY COUPLED; CAPACITIVELY COUPLED PLASMAS; DUAL-FREQUENCY CAPACITIVELY COUPLED PLASMAS; MULTI-CRYSTALLINE SILICON; MULTICRYSTALLINE SILICON (MC-SI); RADIO FREQUENCIES; SPECTRAL INTENSITY; TEXTURING TECHNIQUES;

SILICON;

EID: 84901992525     PISSN: 16741056     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-1056/23/6/065201     Document Type: Article

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