Distribution of electric field in the sheath of an electronegative plasma

Applied Physics Letters

Volumn 90, Issue 1, 2007, Pages

  Takizawa, K ^a,b   Kono, A ^a   Sasaki, K ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b MITSUI ENGINEERING AND SHIPBUILDING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONEGATIVE PLASMAS; LASER INDUCED FLUORESCENCE DIP SPECTROSCOPY; LOCALIZED DISTANCE; THEORETICAL CALCULATION;

ELECTRIC POWER DISTRIBUTION; ELECTRODES; FLUORESCENCE; NEGATIVE IONS; PLASMA SHEATHS; REFLECTION;

ELECTRIC FIELDS;

EID: 33846109937     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2429026     Document Type: Article

References (18)

1. H. Otake and S. Samukawa, Appl. Phys. Lett. 68, 2416 (1996).
2. T. Nozawa, T. Kinoshita, T. Nishizuka, A. Narai, T. Inoue, and A. Nakaue, Jpn. J. Appl. Phys., Part 1 34, 2107 (1995).
3. K. Hashimoto, Jpn. J. Appl. Phys., Part 1 33, 6013 (1994).
4. N. Fujiwara, S. Ogino, T. Maruyama, and M. Yoneda, Plasma Sources Sci. Technol. 5, 126 (1996).
5. N. St. J. Braithwaite and J. E. Allen, J. Phys. D 21, 1733 (1988).
6. H. Amemiya, B. M. Annaratone, and J. E. Allen, Plasma Sources Sci. Technol. 8, 179 (1999).
7. R. N. Franklin, Plasma Sources Sci. Technol. 9, 191 (2000).
8. B. M. Annaratone, T. Antonova, H. M. Thomas, and G. E. Morfill, Phys. Rev. Lett. 93, 185001 (2004).
9. K. Takizawa, K. Sasaki, and K. Kadota, Jpn. J. Appl. Phys., Part 2 41, L1285 (2002).
10. K. Takizawa, K. Sasaki, and A. Kono, Appl. Phys. Lett. 84, 185 (2004).
11. H. Kokura, K. Nakamura, I. Ghanashev, and H. Sugai, Jpn. J. Appl. Phys., Part 1 38, 5262 (1999).
12. P. Chabert, A. J. Lichtenberg, M. A. Lieberman, and A. M. Marakhtanov, Plasma Sources Sci. Technol. 10, 478 (2001).
13. A. Kono, J. Phys. D 32, 1357 (1999).
14. A. Kono, J. Phys. D 34, 1083 (2001).
15. A. Kono, J. Phys. D 36, 465 (2003).
16. R. S. Robinson, J. Vac. Sci. Technol. 16, 185 (1979).
17. H. C. Straub, P. Renault, B. G. Lindsay, K. A. Smith, and R. F. Stebbings, Phys. Rev. A 52, 1115 (1995).
18. U. Czarnetzki, D. Luggenhölscher, V. A. Kadetov, and H. F. Döbele, Pure Appl. Chem. 77, 345 (2005).