Modeling microwave resonance of curling probe for density measurements in reactive plasmas

Applied Physics Express

Volumn 4, Issue 6, 2011, Pages

  Liang, Iji ^a   Nakamura, Keiji ^a   Sugai, Hideo ^a  

^a CHUBU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL FORMULAS; ELECTROMAGNETIC FIELD STRUCTURE; FREQUENCY DEPENDENCE; HIGH FREQUENCY HF; LOW FREQUENCY; MICROWAVE RESONANCE; MICROWAVE RESONATORS; POWER REFLECTION COEFFICIENT; REACTIVE PLASMAS; RESONANCE CHARACTERISTIC; RESONANCE FREQUENCIES; SPIRAL SLOTS; VOLUME WAVES; WAVE RESONANCES;

CARRIER CONCENTRATION; DENSITOMETERS; DENSITY FUNCTIONAL THEORY; DENSITY MEASUREMENT (OPTICAL); DENSITY MEASUREMENT (SPECIFIC GRAVITY); ELECTROMAGNETIC FIELDS; ELECTRON DENSITY MEASUREMENT; FINITE DIFFERENCE TIME DOMAIN METHOD; MICROWAVE DEVICES; MONOPOLE ANTENNAS; PROBES; SLOT ANTENNAS; SPIRAL ANTENNAS; SURFACE WAVES; TIME DOMAIN ANALYSIS;

RESONANCE;

EID: 79958835925     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.4.066101     Document Type: Article

References (28)

1. M. A. Heald and C. B. Wharton: Plasma Diagnostics with Microwaves (Wiley, New York, 1965) p. 192.
2. F. F. Chen: in Plasma Diagnostic Techniques, ed. R. H. Huddlestone and S. L. Leonard (Academic, New York, 1965) p. 113.
3. T. Shirakawa and H. Sugai: Jpn. J. Appl. Phys. 32 (1993) 5129.
4. H. Sugai et al.: Mater. Res. Soc. Symp. Proc. 406 (1996) 15.
5. H. Kokura et al.: Jpn. J. Appl. Phys. 38 (1999) 5262.
6. K. Nakamura et al.: J. Vac. Sci. Technol. 21 (2003) 325.
7. S. Kobayashi and K. Ramaswamy: Jpn. J. Appl. Phys. 46 (2007) 6834.
8. M. Lapke et al.: Appl. Phys. Lett. 90 (2007) 121502.
9. H. Sugai et al.: Plasma Sources Sci. Technol. 10 (2001) 378.
10. O. Hirano et al.: Proc. 6th Int. Conf. Reactive Plasmas/23rd Symp. Plasma Processing, 2006, p. 727.
11. K. Kinoshita et al.: Abstr. American Vacuum Society 56th Int. Symp. Exhib., 2006, p. 149.
12. K. Nakamura et al.: Proc. Int. Symp. Dry Process, 2004, P-29.
13. S. Dine et al.: Plasma Sources Sci. Technol. 14 (2005) 777.
14. M. Lapke et al.: Appl. Phys. Lett. 93 (2008) 051502.
15. C. Schawitz et al.: Appl. Phys. Lett. 94 (2009) 011502.
16. R. L. Stenzel: Rev. Sci. Instrum. 47 (1976) 603.
17. R. B. Piejak et al.: J. Appl. Phys. 95 (2004) 3785.
18. J. Xu et al.: Plasma Sources Sci. Technol. 18 (2009) 045009.
19. J. Xu et al.: Chin. Phys. B 19 (2010) 075206.
20. S. Yajima et al.: Proc. Int. Symp. Dry Process, 2005, p. 213.
21. K. Nakamura et al.: Proc. 30th Int. Symp. Dry Process, 2008, p. 181.
22. K. Nakamura et al.: Abstr. 62nd Gaseous Electronics Conf., 2009, p. 84.
23. K. S. Yee: IEEE Trans. Antennas Propag. 14 (1966) 302.
24. CST MICROWAVE STUDIO: http://www.cst.com
25. M. A. Lieberman and A. J. Lichtenberg: Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994) p. 444.
26. J. Galejs: IRE Trans. Antennas Propag. 10 (1962) 436.
27. S. B. Cohn: IEEE Trans. Microwave Theory Tech. 17 (1969) 768.
28. I. Liang et al.: Proc. 3rd Int. Symp. Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, 2011, p. 9.