Rie-texturing of multicrystalline silicon solar cells

Solar Energy Materials and Solar Cells

Volumn 74, Issue 1-4, 2002, Pages 133-137

  Ruby, D S ^a   Zaidi, S H ^b   Narayanan, S ^c   Damiani, B M ^d   Rohatgi, A ^d  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b Gratings Incorporated   (United States)

^c BP Solar ^*  (United States)

^d GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Multicrystalline silicon cells; Plasma etching; Plasma texturing; Silicon solar cells

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRIC CURRENTS; PLASMA ETCHING; REACTIVE ION ETCHING; SCREEN PRINTING; TEXTURES;

PLASMA TEXTURING;

SILICON SOLAR CELLS;

EID: 0036777610     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(02)00057-0     Document Type: Article

References (2)

1. Surface texturing of large area multicrystalline Si solar cells using reactive ion etching method
2. Plasma-texturization for multicrystalline silicon solar cells