Reactive ion etching (RIE) technique for application in crystalline silicon solar cells

Solar Energy

Volumn 84, Issue 4, 2010, Pages 730-734

  Yoo, Jinsu ^a  

^a Korea Institute of Energy Research (KIER)   (South Korea)

Author keywords

Conversion efficiency; Reactive ion etching; Saw damage removal; Solar cell; Texturization

Indexed keywords

ACIDIC MIXTURES; ALKALI SOLUTIONS; ALKALINE SOLUTIONS; CRYSTALLINE SILICON SOLAR CELLS; CRYSTALLINE SILICON WAFERS; HIGH-EFFICIENCY SOLAR CELLS; NAOH SOLUTIONS; SAW DAMAGE REMOVAL; SAW DAMAGES; SILICON SURFACES; SOLAR CELL PROCESSING; SURFACE REFLECTANCE; TEXTURIZATION; THIN WAFERS; WET CHEMICAL PROCESS;

ALKALINITY; CONVERSION EFFICIENCY; CRYSTALLINE MATERIALS; FABRICATION; INFORMATION RETRIEVAL; IONS; SAWING; SEMICONDUCTING SILICON COMPOUNDS; SILICON SOLAR CELLS; SILICON WAFERS; SOLAR CELLS; TEXTURING;

REACTIVE ION ETCHING;

CHEMICAL PROCESS; CRYSTALLINITY; ION; SILICON; SOLAR POWER; TEXTURE;

EID: 77949261481     PISSN: 0038092X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solener.2010.01.031     Document Type: Article

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