Emission, thermocouple, and electrical measurements in SF6/Ar/O2 SiC etching discharges

Journal of Applied Physics

Volumn 94, Issue 2, 2003, Pages 822-830

  Brown, Michael S ^a   Scofield, James D ^b   Ganguly, Biswa N ^b  

^a INNOVATIVE SCIENTIFIC SOLUTIONS INC   (United States)

^b AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; ELECTRIC FIELD EFFECTS; ETCHING; PLASMA APPLICATIONS; POLYMERS; QUENCHING; THERMOCOUPLES;

ACTINOMETER;

SILICON CARBIDE;

EID: 0042768592     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1580197     Document Type: Article

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