Negative ions in single and dual frequency capacitively coupled fluorocarbon plasmas

Plasma Sources Science and Technology

Volumn 16, Issue 1, 2007, Pages

  Curley, G A ^a   Maric D ^a,c   Booth, J P ^a   Corr, C S ^a,b   Chabert, P ^a   Guillon, J ^a  

^a ECOLE POLYTECHNIQUE   (France)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^c UNIVERSITY OF BELGRADE   (Serbia)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CHARGED PARTICLES; FLUOROCARBONS; GAS MIXTURES; PLASMAS;

CHARGED PARTICLE DYNAMICS; DUAL FREQUENCY PLASMAS; NEGATIVE ION FRACTIONS; OPTICAL MEASUREMENTS;

NEGATIVE IONS;

EID: 33947635106     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/16/1/S09     Document Type: Conference Paper

References (32)

1. Booth J P, Corr C S, Curley G A, Jolly J and Guillon J 2006 Appl. Phys. Lett. 88 151502
2. Goto H H, Lowe H D and Ohmi T 1992 J. Vac. Sci. Technol. A 10 3048-54
3. Boyle P C, Ellingboe A R and Turner M M 2004 J. Phys. D: Appl. Phys. 37 697-701
4. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
5. Kono A and Ohya Y 2000 Japan. J. Appl. Phys. Part 1 3A 39 1365-8
6. Hebner G A and Abraham I C 2001 J. Appl. Phys. 90 4929-37
7. Jauberteau J L, Meeusen G J, Haverlag M, Kroesen G M W and de Hoog F J 1989 Appl. Phys. Lett. 55 2597-9
8. Sheridan T E, Chabert P and Boswell R W 1999 Plasma Sources Sci. Technol. 8 457-62
9. Boyd R L F and Thompson J B 1959 Proc. R. Soc. A 252 102
10. Braithwaite N S J and Allen J E 1988 J. Phys. D: Appl. Phys. 21 1733-7
11. Choi S J and Kushner M J 1993 J. Appl. Phys. 74 853
12. Howling A A, Sansonnens L, Dorier J L and Hollenstein C 1994 J. Appl. Phys. 75 1340
13. Chabert P, Lichtenberg A J, Lieberman M A and Marakhtanov A M 2001 Plasma Sources Sci. Technol. 10 478-89
14. Ohtake H and Samukava S 1996 Appl. Phys. Lett. 68 2416
15. Kono A and Kato K 2000 Appl. Phys. Lett. 77 495
16. Takada N, Hayashi D, Sasaki K and Kadota K 1997 Japan. J. Appl. Phys. Part 2 36 L1702
17. Bacal M 1993 Plasma Sources Sci. Technol. 2 190-7
18. Nagai S, Sakai M, Furuhashi H, Kono A, Goto T and Uchida Y 1998 IEEE J. Quantum Electron. 34 40-6
19. Quandt E, Kraemer I and Dobele H F 1999 Europhys. Lett. 45 32
20. Chabert P, Sheridan T E, Boswell R W and Perrin J 1999 Plasma Sources Sci. Technol. 8 561-6
21. Sheridan T E 1999 J. Phys. D: Appl. Phys. 32 1761-7
22. Stenzel R L 1976 Rev. Sci. Instrum. 47 603-7
23. Piejak R B, Godyak V A, Garner R, Alexandrovich B M and Sternberg N 2004 J. Appl. Phys. 95 3785-91
24. Piejak R B, Al-Kuzee J and Braithwaite N S J 2005 Plasma Sources Sci. Technol. 14 734-43
25. Curley G, Booth J P and Guillon J 2005 Proc. 27th ICPIG (Eindhoven, Netherlands) Article 08-230
26. Karkari S K and Ellingboe A R 2006 Appl. Phys. Lett. 88 101501
27. Braithwaite N S J, Booth J P and Cunge G 1996 Plasma Sources Sci. Technol. 5 677-84
28. Booth J P, Braithwaite N S J, Goodyear A and Barroy P 2000 Rev. Sci. Instrum. 71 2722-7
29. Vacquié S, Gleizes A and Sabsabi M 1987 Phys. Rev. A 35 1615-20
30. Godyak V A 1986 Soviet Radio Frequency Discharge Research (Falls Church, VA: Delphic Associates)
31. Georgieva V, Bogaerts A and Gijbels R 2003 J. Appl. Phys. 94 3748-56
32. Georgieva V 2006 private communication