Atomic layer deposition of high-purity palladium films from Pd(hfac) 2 and H2 and O2 plasmas

Journal of Physical Chemistry C

Volumn 118, Issue 16, 2014, Pages 8702-8711

  Weber, Matthieu J ^a   MacKus, Adriaan J M ^a   Verheijen, Marcel A ^a,b   Longo, Valentino ^a   Bol, Ageeth A ^a   Kessels, Wilhelmus M M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; CARBON; DEPOSITION; FILM GROWTH; INFRARED SPECTROSCOPY; NANOPARTICLES; PLASMAS; PULSED LASER DEPOSITION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

GAS-PHASE INFRARED SPECTROSCOPY; LOW RESISTIVITY; LOW TEMPERATURES; OXIDE SUBSTRATES; PD NANO PARTICLE; PLASMA REDUCTION; PRECURSOR DOSING; RESISTIVITY VALUES;

PALLADIUM;

EID: 84899556620     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp5009412     Document Type: Article

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