The surface chemistry of hexafluoroacetylacetone on clean and oxygen pre-covered Cu(210): A temperature-programmed desorption study

Surface Science

Volumn 409, Issue 3, 1998, Pages 428-434

  Nigg, H L ^a   Masel, R I ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Carboxylic acid; Chemical vapor; Chemical vapor deposition; Copper

Indexed keywords

ACETONE; CARBOXYLIC ACIDS; CHEMICAL VAPOR DEPOSITION; CONTAMINATION; DESORPTION; ETCHING; OXIDATION; OXYGEN; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE CLEANING; SURFACE PHENOMENA; TEMPERATURE PROGRAMMED DESORPTION;

HEXAFLUOROACETYLACETONE;

COPPER;

EID: 0032118642     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00197-6     Document Type: Article

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