An investigation on the removal characteristics of compound materials during ion beam sputtering using the Kinetic Monte Carlo method

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 323, Issue , 2014, Pages 1-6

  Liang, Xiao ^a   Wang, Xiang ^a   Miao, Erlong ^b   Zheng, Jinjin ^a   Wang, Fei ^b   Wang, Gaowen ^b   Gu, Yongqiang ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b CHANGCHUN INSTITUTE OF OPTICS   (China)

Author keywords

Binary compound; Ion beam; Kinetic Monte Carlo simulation; Preferential sputtering; Removal characteristics

Indexed keywords

BINARY COMPOUNDS; CONTRASTIVE ANALYSIS; ION-BEAM SPUTTERING; KINETIC MONTE CARLO METHODS; KINETIC MONTE CARLO SIMULATION; PREFERENTIAL SPUTTERING; REMOVAL CHARACTERISTICS; SURFACE BINDING ENERGIES;

ATOMS; BINDING ENERGY; COMPUTER SIMULATION; EXPERIMENTS; ION BEAMS; KINETICS;

MONTE CARLO METHODS;

EID: 84893506108     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2014.01.010     Document Type: Article

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