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Volumn 4, Issue 4, 2008, Pages 273-275

Monte Carlo simulation for the sputtering yield of Si3N 4 thin film milled by focused ion beams

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC; ION BOMBARDMENT; IONS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SPUTTERING; THICK FILMS; THIN FILM DEVICES; THIN FILMS;

EID: 56749131452     PISSN: 16731905     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11801-008-7144-1     Document Type: Article
Times cited : (4)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.