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Volumn 4, Issue 4, 2008, Pages 273-275
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Monte Carlo simulation for the sputtering yield of Si3N 4 thin film milled by focused ion beams
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Author keywords
[No Author keywords available]
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Indexed keywords
ARSENIC;
ION BOMBARDMENT;
IONS;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON;
SPUTTERING;
THICK FILMS;
THIN FILM DEVICES;
THIN FILMS;
INCIDENT ANGLES;
INCIDENT IONS;
MONTE CARLO SIMULATIONS;
SPUTTERING YIELDS;
MONTE CARLO METHODS;
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EID: 56749131452
PISSN: 16731905
EISSN: None
Source Type: Journal
DOI: 10.1007/s11801-008-7144-1 Document Type: Article |
Times cited : (4)
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References (14)
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