Evolution of ion-induced ripple patterns on SiO2 surfaces

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 267, Issue 4, 2009, Pages 656-659

  Keller, Adrian ^a   Facsko, Stefan ^a   Möller, Wolfhard ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

AFM; Amorphization; Ion sputtering; Nanopatterning

Indexed keywords

AMORPHIZATION; ATOMIC FORCE MICROSCOPY; FLUID DYNAMICS; IONS; SILICON COMPOUNDS; SPUTTERING; SURFACE CHEMISTRY; SURFACE ROUGHNESS; SURFACE TENSION;

AFM; ATOMIC FORCES; BRADLEY-HARPER MODELS; ION FLUENCE; ION SPUTTERING; NANO-SCALE; NANOPATTERNING; NEAR SURFACES; PATTERN FORMATIONS; RIPPLE PATTERNS; RIPPLE WAVELENGTHS; SINGLE-CRYSTALLINE; SUB-KEV; SURFACE ENERGIES;

SURFACES;

EID: 61349101375     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2008.11.044     Document Type: Article

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