Spatial coherence in electron-beam patterning

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 28, Issue 5, 2010, Pages 1048-1055

  Perera, Ginusha M ^a   Stein, Gila E ^a   Liddle, J Alexander ^b  

^a UNIVERSITY OF HOUSTON   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC NOISE; DATA COMPRESSION; DIFFRACTION; ELECTRONS; ERRORS; PHOTONIC DEVICES; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ADVERSE EFFECT; CAVITY QUALITY FACTOR; CENTER WAVELENGTH; COUPLING EFFICIENCY; DIFFRACTION PROFILES; ELECTRON BEAM PATTERNING; ELECTRON BEAM SYSTEMS; ELECTRON DENSITY PROFILES; FOURIER SPACE; GRATING PITCH; LINE GRATING; NOISE FREQUENCIES; NOISE SOURCE; SATELLITE PEAKS; SEM; SEM MICROGRAPHS; SIMPLE METHOD; SPATIAL COHERENCE; STANDARD DEVIATION; TOOL MANUFACTURERS; XRD;

FOURIER TRANSFORMS;

EID: 77957748524     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3490407     Document Type: Article

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