X-ray Lithography: Fundamentals and Applications

Nano-Lithography

Volumn , Issue , 2013, Pages 1-86

  Tormen, Massimo ^a   Grenci, Gianluca ^a   Marmiroli, Benedetta ^b   Romanato, Filippo ^a,c  

^a UNIVERSITY OF PADOVA   (Italy)

^b ERICH SCHMID INSTITUTE OF MATERIALS SCIENCE   (Austria)

^c INFM   (Italy)

Author keywords

3D nano structuring; Absorption in resist; Diffraction effects; Electro Discharge Machining process (EDM); NanoImprint (NIL); Optimal photon energy; Poisson's spot; Rayleigh Sommerfeld formulation; Shadow printing technique; The mask; X ray Lithography

Indexed keywords

EID: 84886332862     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1002/9781118622582.ch1     Document Type: Chapter

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