Status of diamond as membrane material for X-ray lithography masks

Diamond and Related Materials

Volumn 5, Issue 6-8, 1996, Pages 812-818

  Ravet, M F ^a   Rousseaux, F ^a  

^a CNRS   (France)

Author keywords

Masks; Radiation; X ray lithography

Indexed keywords

EID: 0003101986     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(95)00373-8     Document Type: Article

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