Three-dimensional micro- and nanostructuring by combination of nanoimprint and x-ray lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 2, 2004, Pages 766-770

  Tormen, Massimo ^a   Romanato, Filippo ^a   Altissimo, Matteo ^a   Businaro, Luca ^a   Candeloro, Patrizio ^a   Di Fabrizio, Enzo M ^a  

^a LABORATORIO TASC   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COMPUTER SIMULATION; ETCHING; EVAPORATION; FUSED SILICA; LIGHT INTERFERENCE; MASKS; NANOSTRUCTURED MATERIALS; OPTICAL RESOLVING POWER; PHOTONS; POLYMERIC MEMBRANES; POLYMETHYL METHACRYLATES; SILICON NITRIDE; SPECTRUM ANALYSIS; X RAY LITHOGRAPHY;

CHEMICALLY AMPLIFIED RESISTS; HOT EMBOSSING; NANOIMPRINT; THERMOPLASTIC FILMS;

PLASTIC FILMS;

EID: 2342592628     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1688356     Document Type: Article

References (21)

1. H. G. Craighead, Science 290, 1535 (2000).
2. H. Wu, T. W. Odom, D. T. Chiu, and G. M. Whitesides, J. Am. Chem. Soc. 125, 554 (2003).
3. P. Ehbets, H. P. Herzig, D. Prongué, and M. T. Gale, Opt. Lett. 17, 908 (1992).
4. E. Di Fabrizio, F. Romanato, M. Gentili, S. Cabrini, B. Kaulich, J. Susini, and R. Barrett, Nature (London) 401, 895 (1999).
5. Y. A. Vlasov, X. Z. Bo, J. C. Sturm, and D. J. Norris, Nature (London) 414, 289 (2001).
6. J. Khandurina and A. Guttman, J. Chromatogr., A 943, 159 (2002).
7. M. J. Vasile, R. Nassar, and J. Xie, J. Vac. Sci. Technol. B 16, 2499 (1998).
8. P. Mouroulis, F. T. Hartley, D. W. Wilson, and V. E. White, Opt. Express 11, 270 (2003).
9. C. Cuisin, A. Chelnokov, J.-M. Lourtioz, D. Decanini, and Y. Chen, Appl. Phys. Lett. 77, 770 (2000); F. Romanato et al., Microelectron. Eng. 67-68, 679 (2003).
10. C. Cuisin, A. Chelnokov, J.-M. Lourtioz, D. Decanini, and Y. Chen, Appl. Phys. Lett. 77, 770 (2000); F. Romanato et al., Microelectron. Eng. 67-68, 679 (2003).
11. M. J. Vasile, R. Nassar, and J. Xie, J. Vac. Sci. Technol. B 16, 2499 (1998).
12. M. Li, L. Chen, and S. Y. Chou, Appl. Phys. Lett. 78, 3322 (2001).
13. J. R. Anderson, D. T. Chiu, R. J. Jackman, O. Chemiavskaya, J. C. McDonald, H. K. Wu, S. H. Whitesides, and G. M. Whitesides, Anal. Chem. 72, 3158 (2000).
14. J. A. Rogers, R. J. Jackman, G. M. Whitesides, D. L. Olson, and J. V. Sweedler, Appl. Phys. Lett. 70, 2464 (1997).
15. T. Tanaka, H.-B. Sun, and S. Kawata, Appl. Phys. Lett. 80, 312 (2002).
16. M. Li, L. Chen, W. Zhang, and S. Y. Chou, Nanotechnology 14, 33 (2003).
17. E. Di Fabrizio, A. Nucara, M. Gentili, and R. Cingolani, Rev. Sci. Instrum. 70, 1605 (1999).
18. M. Altissimo, F. Romanato, L. Vaccari, L. Businaro, D. Cojoc, B. Kaulieh, S. Cabrini, and E. Di Fabrizio, Microelectron. Eng. 61-62, 173 (2002).
19. L. Businaro, F. Romanato, P. Candeloro, E. Di Fabrizio, M. Patrini, M. Galli, C. Andreani, A. Passaseo, and M. De Vittorio, J. Vac. Sci. Technol. B 21, 748 (2003).
20. M. Khan, L. Mohammad, J. Xiao, L. Ocola, and F. Cerrina, J. Vac. Sci. Teehnol. B 12, 3930 (1994).
21. F. Romanato, E. Di Fabrizio, L. Vaccari, M. Altissimo, D. Cojoc, L. Businaro, and S. Cabrini, Microelectron. Eng. 57-58, 101 (2001).