X-ray and electron-beam lithography of three-dimensional array structures for photonics

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2912-2917

  Romanato, F ^a   Cojoc, D ^a   Di Fabrizio, E ^a   Galli, M ^b   Bajoni, D ^b  

^a LABORATORIO TASC   (Italy)

^b UNIVERSITY OF PAVIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE MEASUREMENT; ARRAYS; BAND STRUCTURE; CRYSTAL DEFECTS; ELECTRON BEAM LITHOGRAPHY; ETCHING; LIGHT REFLECTION; OPTICAL WAVEGUIDES; OPTIMIZATION; RESONANCE; X RAY LITHOGRAPHY;

NANOMETRIC ALIGNMENT; PHOTONIC CRYSTALS (PC); WAVEGUIDE DEFECTS (WGD);

CRYSTAL LATTICES;

EID: 0942300029     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1629295     Document Type: Conference Paper

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