High resolution x-ray mask fabrication by a 100 keV electron-beam lithography system

Journal of Micromechanics and Microengineering

Volumn 14, Issue 5, 2004, Pages 722-726

  Wang, Lin ^a   Desta, Yohannes M ^a   Fettig, Rainer K ^b   Goettert, Jost ^a   Hein, Herbert ^b   Jakobs, Peter ^b   Schulz, Joachim ^b  

^a LOUISIANA STATE UNIVERSITY   (United States)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; MASKS; MICROSTRUCTURE; POLYMETHYL METHACRYLATES; SCANNING ELECTRON MICROSCOPY; X RAY LITHOGRAPHY;

HIGH ASPECT RATIO MICROSTRUCTURES (HARMS); PATTERN FABRICATION; PATTERN UNIFORMITY; X RAY MASKS;

MICROELECTROMECHANICAL DEVICES;

EID: 2542468602     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/14/5/010     Document Type: Article

References (8)

1. Wang L et al 2002 High resolution x-ray masks for the application of high aspect ratio microelectromechanical systems (HARMS) Proc. SPIE 5037 1084-91
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