Computer simulations for mask structure heating in X-ray lithography

Computers and Structures

Volumn 58, Issue 4, 1996, Pages 825-834

  Li, Dz Chi ^a   Chen, Jeng Tzong ^b   Chyuan, Shiang Woei ^c   Sun, Cherng Yuan ^d  

^a NATIONAL UNITED UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

^c CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY   (Taiwan)

^d NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; FINITE ELEMENT METHOD; HEAT TRANSFER; INTERFACES (MATERIALS); MASKS; SILICON ALLOYS; STRESS ANALYSIS; SUBSTRATES; TEMPERATURE DISTRIBUTION; THERMAL EFFECTS; THERMAL STRESS;

MASK STRUCTURE; SOFTWARE PACKAGE MSC/NASTRAN; THERMAL DISPLACEMENT CONTOUR;

X RAY LITHOGRAPHY;

EID: 0030082097     PISSN: 00457949     EISSN: None     Source Type: Journal    
DOI: 10.1016/0045-7949(95)00063-M     Document Type: Article

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