A path: From electroplating through lithographic masks in electronics to LIGA in MEMS

Electrochimica Acta

Volumn 42, Issue 20-22, 1997, Pages 2985-3005

  Romankiw, L T ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Electronic devices; Electroplating; Electroplating through mask; LIGA; Lithography; Magnetic heads

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRONIC EQUIPMENT MANUFACTURE; MAGNETIC HEADS; MAGNETIC THIN FILMS; MASKS; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY;

OPTICAL LITHOGRAPHY;

ELECTROPLATING;

EID: 0030703837     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(97)00146-1     Document Type: Review

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