Modeling, fabrication, and experimental application of clear x-ray phase masks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3575-3580

  Malueg, Daniel H ^a   Taylor, James W ^a   Thielman, Don ^a   Leonard, Quinn ^a   Dhuey, Scott ^a   Cerrina, Franco ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BRIGHT PEAK ENHANCED X-RAY PHASE MASK (BPEXPM); CRITICAL DIMENSION (CD); FRESNEL DIFFRACTION; IMAGE INTENSITY;

COMPUTER SIMULATION; ELECTROMAGNETIC WAVE DIFFRACTION; IMAGE ANALYSIS; INTEGRATED CIRCUIT LAYOUT; OSCILLATIONS; PHASE SHIFT; PHOTOLITHOGRAPHY; PROJECTION SYSTEMS; SILICON NITRIDE;

MASKS;

EID: 13244295786     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1809626     Document Type: Conference Paper

References (11)

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