Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 3, 2013, Pages

  Chaukulkar, Rohan P ^a   Agarwal, Sumit ^a  

^a Department of Metallurgical and Materials Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIRECT DECOMPOSITION; INTERFACIAL OXIDES; SEMI-CONDUCTOR SURFACES; SURFACE INFRARED SPECTROSCOPY; SURFACE REACTION MECHANISM; TITANIUM TETRACHLORIDES; TITANIUM TETRAISOPROPOXIDE; UV-VIS SPECTROSCOPY;

DECOMPOSITION; DEPOSITION; FILM GROWTH; INFRARED SPECTROSCOPY; LEAD OXIDE; OXYGEN; PHOTOELECTRONS; SURFACE REACTIONS; TITANIUM; TITANIUM DIOXIDE; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION;

EID: 84877773717     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4798385     Document Type: Article

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