Recent progress in thin film epitaxy across the misfit scale (2011 Acta Gold Medal Paper)

Acta Materialia

Volumn 61, Issue 8, 2013, Pages 2703-2724

  Narayan, J ^a  

^a North Carolina State University   (United States)

Author keywords

Domain matching epitaxy; Integration across the misfit scale; Mechanism of strain relaxation; Multifunctional epitaxial structures; Thin film epitaxy across the misfit scale

Indexed keywords

DISLOCATION NUCLEATION; DOMAIN MATCHING EPITAXY; EPITAXIAL STRUCTURE; LATTICE MISFIT STRAIN; SELF-ASSEMBLED NANODOTS; STEP FORMATION ENERGY; STRAIN RELAXATION MECHANISM; THIN FILM EPITAXY;

COMPRESSIVE STRESS; COOLING; COOLING SYSTEMS; DEFECTS; ELECTRONIC PROPERTIES; FILM GROWTH; GROWTH TEMPERATURE; INTEGRATION; INTERFACES (MATERIALS); NUCLEATION; SILICON; STRAIN; STRAIN RELAXATION; TENSILE STRESS; THIN FILMS;

EPITAXIAL GROWTH;

EID: 84875472370     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2012.09.070     Document Type: Article

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